Synthesis and structure-activity studies of alkyl-substituted .gamma.-butyrolactones and .gamma.-thiobutyrolactones: ligands for the picrotoxin receptor
作者:Daniel J. Canney、Katherine D. Holland、Jeffrey A. Levine、Ann C. McKeon、James A. Ferrendelli、Douglas F. Covey
DOI:10.1021/jm00108a034
日期:1991.4
alpha-substituted anticonvulsant to become a convulsant. In general, sulfur for oxygen heteroatom substitution in the alpha-substituted lactones resulted in improved anticonvulsant potency and spectrum of activity. Binding of these compounds to the picrotoxin site of the GABA receptor complex was demonstrated with a [35S]-tert-butylbicyclophosphorothionate radioligandbindingassay. Measurements of
Reversal of regioselectivity in the reduction of gem-disubstituted cyclic carboxylic acid anhydrides
作者:Peter Morand、Judith Salvator、Margaret M. Kayser
DOI:10.1039/c39820000458
日期:——
The regioselective partial reduction of gem-disubstituted cycliccarboxylicacidanhydrides to the corresponding γ-lactones with LiAlH 4or NaBH4is almost completely reversed when potassium tri-s butylborohydride is used as the reducing agent.
Chemical amplification type positive photosensitive resin composition, a photosensitive dry film, a method for producing a photosensitive dry film, a method for producing a patterned resist film, a method of manufacturing a template with a substrate, and a method of manufacturing a plated shaped product, and a Mercapto compound
申请人:TOKYO OHKA KOGYO CO., LTD.
公开号:US11061326B2
公开(公告)日:2021-07-13
A chemically amplified positive-type photosensitive resin composition capable of suppressing the occurrence of “footing” in which the width of the bottom (the side proximal to the surface of a support) becomes narrower than the top (the side proximal to the surface of a resist layer) in the nonresist portion when a resist pattern serving as a template for a plated article is formed on a metal surface of a substrate having a metal surface using the composition. A mercapto compound having the formula (C) shown below is added to the composition and includes an acid generator which generates acid upon exposure to an irradiated active ray or radiation and a resin the solubility of which in alkali increases under the action of acid:
wherein n1, n2, Rc1, and Rc are defined in claim 1.