Disclosed are a photosensitive resin composition which comprises:
(A) a compound having a carboxyl group;
(B) a resin having a carboxyl group;
(C) a photopolymerizable unsaturated compound having an ethylenic unsaturated group;
(D) a photopolymerization initiator which produces free radical by irradiation of active light; and
(E) a phosphor,
a photosensitive film and a process for preparing a fluorescent pattern using the same, and a phosphor subjected to surface treatment and a process for preparing the same.
所公开的光敏
树脂组合物包括
(A) 具有羧基的化合物;
(B) 具有羧基的
树脂
(C) 具有
乙烯基不饱和基团的可光聚合不饱和化合物;
(D) 光聚合
引发剂,通过活性光照射产生自由基;以及
(E) 荧光体、
一种光敏胶片和用其制备荧光图案的工艺,以及一种经表面处理的荧光粉和制备荧光粉的工艺。