norborn-5-en-2-yl-acetaldehyde | 80376-88-1

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: norborn-5-en-2-yl-acetaldehyde
• 英文别名: 2-(5-norbornen-2-yl)acetaldehyde；(5-norbornen-2-yl)acetoaldehyde；exo,endo-5-Norbornenylacetaldehyd；Norbornylen-(5)-ylacetaldehyd；Bicyclo[2.2.1]hept-5-en-2-yl-acetaldehyde；2-(2-bicyclo[2.2.1]hept-5-enyl)acetaldehyde
• CAS: 80376-88-1
• 化学式: C₉H₁₂O
• 分子量: 136.194
• InChiKey: HGPAAOXEISGNNV-UHFFFAOYSA-N

物化性质

• 沸点：
  210.8±9.0 °C(Predicted)
• 密度：
  1.020±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  1.5
• 重原子数：
  10
• 可旋转键数：
  2
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.67
• 拓扑面积：
  17.1
• 氢给体数：
  0
• 氢受体数：
  1

反应信息

• 作为反应物：
  描述：

  norborn-5-en-2-yl-acetaldehyde 在 chromium(VI) oxide 、 硫酸 作用下， 以 丙酮 为溶剂， 生成 5-(propanoyl-2)bicyclo<2.2.1>-2-heptene
  参考文献：
  名称：

  Photochemistry of 5-norbornenylacetone and 5-norbornenylacetaldehyde

  摘要：

  DOI：

  10.1021/jo00827a047
• 作为产物：
  描述：

  2-(norborn-5-en-2-yl)ethanol 在 chromium(VI) oxide 、 硫酸 作用下， 以 丙酮 为溶剂， 生成 norborn-5-en-2-yl-acetaldehyde
  参考文献：
  名称：

  Photochemistry of 5-norbornenylacetone and 5-norbornenylacetaldehyde

  摘要：

  DOI：

  10.1021/jo00827a047

文献信息

• Method for Producing Compound Containing BIS (Perfluoroalkylsulfonyl) Methyl Group and Salt Thereof, and Solid Electrolyte Membrane Produced Using Same
  申请人：CENTRAL GLASS COMPANY, LIMITED

  公开号：US20150266816A1

  公开（公告）日：2015-09-24

  [Problem] To provide a method for producing a compound having a bis(trifluoroalkanesulfonyl)methyl group, which is a compound having a high acidity degree and hydrophobicity and useful as a raw material compound for a resin, and a salt thereof in a simple manner. [Solution] A method for producing a compound containing a bis(perfluoroalkylsulfonyl)methyl group and represented by the following formula and a salt of the compound. (Rf represents a perfluoroalkyl group having 1 to 12 carbon atoms. A represents a monovalent organic group. Y represents a single bond or a C 1 -C 4 linear, C 3 -C 4 branched or C 3 -C 4 cyclic alkylene group wherein each of some or all of hydrogen atoms may be substituted with a fluorine atom, a chlorine atom, a bromine atom or an iodine atom and an ether bond or an ester bond may be contained.)

  提供一种简单的方法，用于生产具有高酸度和疏水性的双(三氟烷磺酰基)甲基基团的化合物，该化合物可作为树脂的原料化合物，并提供该化合物的盐。生产含有双(全氟烷基磺酰基)甲基基团的化合物及其盐的方法如下所示： （Rf代表具有1至12个碳原子的全氟烷基基团。A代表一价有机基团。Y代表单键或C1-C4线性、C3-C4支链或C3-C4环烷基基团，其中部分或全部氢原子可被氟原子、氯原子、溴原子或碘原子取代，并且可能包含醚键或酯键。）
• Novel lactone compounds having alicyclic structure and their manufacturing method
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US20020019545A1

  公开（公告）日：2002-02-14

  Lactone compounds of formula (1) are useful as monomers to form base resins for use in chemically amplified resist compositions adapted for micropatterning lithography. 1 R 1 is H or C 1-6 alkyl, R 2 is H or an acyl or alkoxycarbonyl group of 1-15 carbon atoms which may be substituted with halogen atoms, Z is a divalent C 1-15 organic group which forms a lactone ring with the carbonyloxy group, k is 0 or 1, and m is an integer from 0 to 5.

  公式（1）的内酯化合物作为单体对于形成基树脂很有用，以用于化学增感光刻胶组合物，适用于微细图案制作。1R1为H或C1-6烷基，R2为H或含有1-15个碳原子的酰基或烷氧羰基基团，可能被卤素原子取代，Z为双价的C1-15有机基团，与羰氧基团形成内酯环，k为0或1，m为0到5之间的整数。
• Acetal compound, polymer, resist composition and patterning response
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US06515149B2

  公开（公告）日：2003-02-04

  Acetal compounds in which a 5- or 6-membered ring acetal structure is connected to a norbornene structure through a linker represented by —(CH2)m— in which one hydrogen atom may be substituted with a hydroxyl or acetoxy group, and m is from 1 to 8 are novel. Using the acetal compounds as a monomer, polymers are obtained. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation and has excellent sensitivity, resolution, and etching resistance.

  新型的乙缩醛化合物，其中5-或6-成员环乙缩醛结构通过表示为—（CH2）m—的连接剂连接到诺博尔烯结构中，其中一个氢原子可以被羟基或乙酰氧基取代，m为1至8。使用乙缩醛化合物作为单体，得到聚合物。以该聚合物为基础树脂的抗蚀剂组合物对高能辐射敏感，并具有优异的敏感性、分辨率和蚀刻抗性。
• Ether, polymer, resist composition and patterning process
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US20020161150A1

  公开（公告）日：2002-10-31

  An ether compound of formula (1) is provided wherein R 1 is H or C 1-6 alkyl, R 2 is C 1-6 alkyl, R 3 is H, C 1-15 acyl or C 1-15 alkoxycarbonyl which may be substituted with halogen atoms, k is 0 or 1, m is from 0 to 3, and n is from 3 to 6. The ether compound is polymerized to form a polymer having improved reactivity, robustness and substrate adhesion. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation, has excellent sensitivity, resolution, and etching resistance, and lends itself to micropatterning with electron beams or deep-UV. 1

  提供了一种化学式为（1）的醚化合物，其中R1为H或C1-6烷基，R2为C1-6烷基，R3为H，C1-15酰基或C1-15烷氧羰基，可以用卤素原子取代，k为0或1，m为0到3，n为3到6。该醚化合物聚合形成具有改进反应性、坚固性和基底附着性的聚合物。以该聚合物为基础树脂的抗蚀剂组合物对高能辐射敏感，具有优异的敏感性、分辨率和蚀刻抵抗性，并适用于电子束或深紫外线微图案化。
• Novel ester compounds having alicyclic structure and method for preparing same
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US20010051742A1

  公开（公告）日：2001-12-13

  Ester compounds of formula (1) are useful as monomers to form base resins for use in chemically amplified resist compositions adapted for micropatterning lithography. 1 R 1 is H or C 1-6 alkyl, R 2 is an unsubstituted or halo-substituted acyl or alkoxycarbonyl group of 1-15 carbon atoms, R 3 is an acid labile group, k is 0 or 1, and m is an integer from 0 to 5.

  式（1）的酯化合物是有用的单体，可形成基础树脂，用于化学增强的抗蚀剂组合物，适用于微图案化学制图。其中，1R1为氢或C1-6烷基，R2为未取代或卤代的1-15个碳原子的酰基或烷氧羰基基团，R3为酸敏感基团，k为0或1，m为0至5的整数。