申请人:Ciba-Geigy Corporation
公开号:US04670604A1
公开(公告)日:1987-06-02
4-Acylresorcinol ethers of the formula ##STR1## in which R.sub.1 is lower alkyl, R.sub.2 is fluorinated lower alkyl, R.sub.3 is hydrogen, lower alkoxy, trifluoromethyl or halogen, alk is an alkylene or hydroxyalkylene radical which is uninterrupted or interrupted by oxygen, one of the radicals R.sub.4, R.sub.5 and R.sub.7 is a group of the formula --NH--C(.dbd.O)--R.sub.8, a radical R.sub.4 or R.sub.5 which differs from this is a radical R.sub.9 and a radical R.sub.7 which differs from this is a radical R.sub.10, R.sub.6 is hydrogen, lower alkyl, trifluoromethyl, halogen, carboxyl which is free, esterified or amidated, cyano or lower alkanoyl, R.sub.8 is carboxyl which is free, esterified or amidated or 5-tetrazolyl, R.sub.9 is hydrogen, lower alkyl, lower alkoxy, halogen or trifluoromethyl and R.sub.10 is hydrogen, lower alkyl, lower alkoxy, halogen, trifluoromethyl, cyano or carboxyl which is free, esterified or amidated, and their salts have antiallergic and antiinflammatory properties. They are prepared, for example, by reacting compounds of the formulae ##STR2## in which one of the radicals X.sub.5 and X.sub.6 is hydroxyl which is free or in salt form and the other is an alkoxy radical substituted by reactive esterified hydroxyl or epoxy. The invention also relates to intermediates of the formula ##STR3## in which R.sub.2 is fluorinated lower alkyl, R.sub.3 is hydrogen, lower alkoxy, trifluoromethyl or halogen and R.sub.11 is hydrogen or a group of the formula R.sub.1 --O(.dbd.O)--, in which R.sub.1 is lower alkyl, and their salts.
公式为##STR1##的4-酰基邻苯二酚醚中,其中R.sub.1为较低的烷基,R.sub.2为氟代较低的烷基,R.sub.3为氢、较低的烷氧基、三氟甲基或卤素,alk为未受氧或被氧中断的烷基或羟基烷基基团,R.sub.4、R.sub.5和R.sub.7中的一个是--NH--C(.dbd.O)--R.sub.8的基团,与此不同的基团R.sub.4或R.sub.5是基团R.sub.9,与此不同的基团R.sub.7是基团R.sub.10,R.sub.6为氢、较低的烷基、三氟甲基、卤素、游离的、酯化的或酰胺化的羧基、氰基或较低的烷酰基,R.sub.8为游离的、酯化的或酰胺化的羧基或5-四唑基,R.sub.9为氢、较低的烷基、较低的烷氧基、卤素或三氟甲基,R.sub.10为氢、较低的烷基、较低的烷氧基、卤素、三氟甲基、氰基或游离的、酯化的或酰胺化的羧基,以及它们的盐具有抗过敏和抗炎性能。例如,通过反应下列公式的化合物制备它们:##STR2##其中X.sub.5和X.sub.6中的一个是游离的或盐形式的羟基,另一个是被反应性酯化羟基或环氧基取代的烷氧基基团。该发明还涉及公式##STR3##中的中间体,其中R.sub.2为氟代较低的烷基,R.sub.3为氢、较低的烷氧基、三氟甲基或卤素,R.sub.11为氢或R.sub.1--O(.dbd.O)--的基团,其中R.sub.1为较低的烷基,以及它们的盐。