申请人:SHIN-ETSU CHEMICAL CO., LTD.
公开号:EP1195390A1
公开(公告)日:2002-04-10
The invention provides a polymer comprising recurring units of formula (1-1) or (1-2) wherein k is 0 or 1, m is 0, 1, 2, 3 or 4, and n is 1 or 2 and having a weight average molecular weight of 1,000 to 500,000. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation, has excellent sensitivity, resolution, and etching resistance, and lends itself to micropatterning with electron beams or deep-UV.
本发明提供了一种由式(1-1)或(1-2)的递归单元组成的聚合物,其中 k 为 0 或 1,m 为 0、1、2、3 或 4,n 为 1 或 2,其重量平均分子量为 1,000 至 500,000。以该聚合物为基体树脂的抗蚀剂组合物对高能辐射敏感,具有优异的灵敏度、分辨率和抗蚀刻性,适合用电子束或深紫外线进行微图案化。