NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, CURED FILM, INSULATING FILM, COLOR FILTER, AND DISPLAY DEVICE
申请人:Tokyo Ohka Kogyo Co., Ltd.
公开号:EP2725423A1
公开(公告)日:2014-04-30
Provided are: a negative-type photosensitive resin composition capable of forming a pattern having favorable adhesiveness at a low light exposure; a pattern forming method using the negative-type photosensitive resin composition; a cured film, an insulating film, and a color filter formed using the negative-type photosensitive resin composition; and a display device provided with the cured film, insulating film, or color filter. The negative-type photosensitive resin composition according to the present invention contains a compound represented by the following formula (1). In the formula, R1 and R2 each independently indicate a hydrogen atom or an organic group, but at least one indicates an organic group. R1 and R2 may be bonded to form a ring structure and may contain a hetero atom bond. R3 indicates a single bond or an organic group. R4 to R9 each independently indicate a hydrogen atom, an organic group, etc., but R6 and R7 are never hydroxyl groups. R10 indicates a hydrogen atom or an organic group.
本发明提供了:一种负型感光树脂组合物,该组合物能够在低光曝光下形成具有良好粘合性的图案;一种使用该负型感光树脂组合物的图案形成方法;一种使用该负型感光树脂组合物形成的固化薄膜、绝缘薄膜和彩色滤光片;以及一种装有该固化薄膜、绝缘薄膜或彩色滤光片的显示装置。根据本发明的负型感光树脂组合物含有下式(1)表示的化合物。式中,R1 和 R2 各自独立地表示氢原子或有机基团,但至少有一个表示有机基团。R1 和 R2 可以键合形成环状结构,也可以含有杂原子键。R3 表示单键或有机基团。R4 至 R9 各自独立地表示氢原子、有机基团等,但 R6 和 R7 绝不是羟基。R10 表示氢原子或有机基团。