CYCLIC COMPOUND, PHOTORESIST BASE, PHOTORESIST COMPOSITION, MICROFABRICATION PROCESS, AND SEMICONDUCTOR DEVICE
申请人:Kashiwamura Takashi
公开号:US20100266952A1
公开(公告)日:2010-10-21
A cyclic compound shown by the following formula (I):
wherein, of two R
1
s which are present on the same aromatic ring, one is a group shown by R
3
, and the other is a dissolution controlling group; R
3
s are independently hydrogen, a substituted or unsubstituted linear aliphatic hydrocarbon group having 1 to 20 carbon atoms, a substituted or unsubstituted branched aliphatic hydrocarbon group having 3 to 12 carbon atoms, a substituted or unsubstituted cyclic aliphatic hydrocarbon group having 3 to 20 carbon atoms, a substituted or unsubstituted aromatic group having 6 to 10 carbon atoms, an alkoxyalkyl group, a silyl group or a group formed by combining these groups with a divalent group.