A photoredox-mediated Minisci C–H alkylation reaction of N-heteroarenes with alkyl boronic acids is reported. A broad range of primary and secondary alkyl groups can be efficiently incorporated into various N-heteroarenes using [Ru(bpy)3]Cl2 as photocatalyst and acetoxybenziodoxole as oxidant under mild conditions. The reaction exhibits excellent substrate scope and functional group tolerance, and
报道了N-杂
芳烃与烷基
硼酸的光氧化还原介导的 Minisci C-H 烷基化反应。在温和条件下,使用[Ru(bpy) 3 ]Cl 2作为光催化剂和乙酰氧基苯并氧杂
环戊烯作为氧化剂,可以将广泛的伯烷基和仲烷基有效地引入各种N-杂
芳烃中。该反应表现出优异的底物范围和官能团耐受性,为复杂底物的后期功能化提供了广泛适用的方法。机理实验和计算研究表明,分子内稳定的邻
碘苯甲酰氧基自由基中间体可能在该反应体系中发挥关键作用。