6-Methacryloyloxy-2-oxohexahydro-3,5-methano-2H-cyclopenta[b]furane-7-carboxylic Acid | 436852-97-0

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 异戊烯醇脂质
• 英文名称: 6-Methacryloyloxy-2-oxohexahydro-3,5-methano-2H-cyclopenta[b]furane-7-carboxylic Acid
• 英文别名: 2-methacryloyloxy-5-oxo-4-oxa-tricyclo[4.2.1.03,7]-nonane-9-carboxylic acid；2-(2-methylprop-2-enoyloxy)-5-oxo-4-oxatricyclo[4.2.1.03,7]nonane-9-carboxylic acid
• CAS: 436852-97-0
• 化学式: C₁₃H₁₄O₆
• 分子量: 266.251
• InChiKey: PQZGIOZEZUVNAW-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  0.8
• 重原子数：
  19
• 可旋转键数：
  4
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.62
• 拓扑面积：
  89.9
• 氢给体数：
  1
• 氢受体数：
  6

反应信息

• 作为反应物：
  描述：

  6-Methacryloyloxy-2-oxohexahydro-3,5-methano-2H-cyclopenta[b]furane-7-carboxylic Acid 以 甲醇 、 水 、 乙腈 为溶剂， 反应 9.5h， 生成
  参考文献：
  名称：

  JP2023/78098

  摘要：

  公开号：
• 作为产物：
  描述：

  7-Tert-butoxycarbonyl-2-oxohexahydro-3,5-methano-2H-cyclopenta[b]furane-6-yl Methacrylate 在 甲酸 作用下， 以 甲酸 为溶剂， 反应 16.0h， 以obtained in Synthesis Example 1-1-1的产率得到6-Methacryloyloxy-2-oxohexahydro-3,5-methano-2H-cyclopenta[b]furane-7-carboxylic Acid
  参考文献：
  名称：

  Sulfonium salt, polymer, chemically amplified resist composition using said polymer, and resist patterning process

  摘要：

  公开了一种由下列通式（1）所示的磺鎵盐。可以有一种磺鎵盐，能够将产生适当酸度的酸的酸生成单元引入到基础聚合物中，而不会影响与基底的附着；使用所述磺鎵盐的聚合物；使用所述聚合物作为基础聚合物的化学放大型光刻胶组合物；以及使用所述化学放大型光刻胶组合物的成图过程。

  公开号：

  US08835097B2

文献信息

• SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME
  申请人：Ichikawa Koji

  公开号：US20110014566A1

  公开（公告）日：2011-01-20

  A salt represented by the formula (I-Pa): wherein X pa represents a single bond or a C1-C4 alkylene group, R pa represents a single bond, a C4-C36 divalent alicyclic hydrocarbon group or a C6-C36 divalent aromatic hydrocarbon group, and one or more methylene groups in the divalent alicyclic hydrocarbon group can be replaced by —O— or —CO—, Y pa represents a polymerizable group, and Z pa+ represents an organic cation.

  由公式(I-Pa)表示的盐，其中Xpa代表单一键或C1-C4亚烷基团，Rpa代表单一键、C4-C36二价脂环烃基团或C6-C36二价芳香烃基团，且脂环烃基团中的一个或多个亚甲基基团可以被—O—或—CO—替换，Ypa代表可聚合团，Zpa+代表有机阳离子。
• POLYMERIZABLE ANION-CONTAINING SULFONIUM SALT AND POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
  申请人：OHASHI Masaki

  公开号：US20100099042A1

  公开（公告）日：2010-04-22

  A polymerizable anion-containing sulfonium salt having formula (1) is provided wherein R 1 is H, F, methyl or trifluoromethyl, R 2 , R 3 and R 4 are C 1 -C 10 alkyl, alkenyl or oxoalkyl or C 6 -C 18 aryl, aralkyl or aryloxoalkyl, or two of R 2 , R 3 and R 4 may bond together to form a ring with S, A is a C 2 -C 20 hydrocarbon group having cyclic structure, and n is 0 or 1. The sulfonium salt generates a very strong sulfonic acid upon exposure to high-energy radiation. A resist composition comprising a polymer derived from the sulfonium salt is also provided.

  提供具有式（1）的可聚合含阴离子的亚砜盐，其中R1为H、F、甲基或三氟甲基，R2、R3和R4为C1-C10烷基、烯基或氧代烷基或C6-C18芳基、芳基烷基或芳基氧代烷基，或R2、R3和R4中的两个可以结合在一起形成与S的环，A为具有环状结构的C2-C20烃基团，n为0或1。该亚砜盐在暴露于高能辐射时生成非常强的磺酸。还提供了一种包含从该亚砜盐衍生的聚合物的抗蚀组合物。
• MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20140045123A1

  公开（公告）日：2014-02-13

  A polymer comprising recurring units derived from a (meth)acrylate monomer of tertiary ester type having branched alkyl on alicycle is used to form a resist composition. When subjected to exposure, PEB and organic solvent development, the resist composition is improved in dissolution contrast.

  一种聚合物，包括由具有支链烷基的萜酸酯单体衍生的重复单元，用于形成抗蚀组合物。在经过曝光、PEB和有机溶剂显影处理后，抗蚀组合物在溶解对比度方面得到改善。
• SULFONIUM SALT, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION USING SAID POLYMER, AND RESIST PATTERNING PROCESS
  申请人：DOMON Daisuke

  公开号：US20120308920A1

  公开（公告）日：2012-12-06

  There is disclosed a sulfonium salt shown by the following general formula (1). There can be a sulfonium salt capable of introducing an acid-generating unit generating an acid having an appropriate acid strength and not impairing adhesion with a substrate into a base polymer; a polymer using the said sulfonium salt; a chemically amplified resist composition using the said polymer as a base polymer; and a patterning process using the said chemically amplified resist composition.

  公开了一种由以下一般式（1）所示的硫銨鹽。可以有一种硫銨鹽，能夠將一個能夠生成具有適當酸度並不損害與基材的粘附性的酸的酸生成單元引入到基聚合物中；使用所述硫銨鹽的聚合物；使用所述聚合物作為基聚合物的化學放大的抗蝕組成物；以及使用所述化學放大的抗蝕組成物的圖案形成過程。
• MONOMER HAVING ELECTRON-WITHDRAWING SUBSTITUENT AND LACTONE SKELETON, POLYMERIC COMPOUND, AND PHOTORESIST COMPOSITION
  申请人：Koyama Hiroshi

  公开号：US20100297555A1

  公开（公告）日：2010-11-25

  Disclosed is a monomer having an electron-withdrawing substituent and a lactone skeleton, represented by following Formula (1), wherein R a represents, e.g., a hydrogen atom or an alkyl group having 1 to 6 carbon atoms; R 1 represents, e.g., a halogen atom or an alkyl or haloalkyl group having 1 to 6 carbon atoms; “A” represents an alkylene group having 1 to 6 carbon atoms, oxygen atom, sulfur atom, or nonbonding; “m” denotes an integer of 0 to 8; Xs each represent an electron-withdrawing substituent; “n” denotes an integer of 1 to 9; and Y represents a bivalent organic group having 1 to 6 carbon atoms. The monomer is useful typically as a monomer component typically for a highly functional polymer, because, when the monomer is applied typically to a resist resin, the resin is satisfactory stable and resistant typically to chemicals, is highly soluble in organic solvents, and has improved hydrolyzability and/or solubility in water after hydrolysis.

  揭示了一种具有吸电子取代基和内酯骨架的单体，由以下式（1）表示，其中R代表，例如，氢原子或具有1至6个碳原子的烷基基团；R1代表，例如，卤素原子或具有1至6个碳原子的烷基或卤代烷基基团；“A”代表具有1至6个碳原子的烷基基团、氧原子、硫原子或非键合基团；“m”表示0至8的整数；Xs各自代表吸电子取代基；“n”表示1至9的整数；Y代表具有1至6个碳原子的二价有机基团。该单体通常用作高功能聚合物的单体组分，因为当该单体通常应用于抗蚀树脂时，树脂通常具有较高的稳定性和抗化学品性能，对有机溶剂具有较高的溶解性，并在水解后具有改善的水解性和/或水溶性。