MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
申请人:SHIN-ETSU CHEMICAL CO., LTD.
公开号:US20150323865A1
公开(公告)日:2015-11-12
A polymer for resist use is obtainable from a monomer having formula (1) wherein R
1
is H, CH
3
or CF
3
, R
2
and R
3
each are H or a monovalent hydrocarbon group, X
1
is a divalent hydrocarbon group, k
1
=0 or 1, and Z forms a 5 or 6-membered alicyclic ring. A resist composition comprising the polymer is shelf stable and displays a high dissolution contrast, controlled acid diffusion and low roughness during both alkaline development and organic solvent development.