申请人:Fujisawa Pharmaceutical Co., Ltd.
公开号:US04341775A1
公开(公告)日:1982-07-27
Bacteriostatic cephem compounds and processes for preparing same having the formula: ##STR1## wherein R.sup.1 is amino or protected amino, R.sup.2 is lower alkyl, amino-(lower)-alkyl, protected amino-(lower)-alkyl, hydroxy-(lower)-alkyl, protected hydroxy-(lower)-alkyl, lower alkylthio-(lower)-alkyl, carboxy-(lower)-alkyl, esterified carboxy-(lower)-alkyl, (C.sub.3 to C.sub.8) cycloalkyl, lower alkenyl or lower alkynyl, R.sup.3 is a heterocyclic group substituted with amino(lower)alkyl, protected amino(lower)-alkyl, hydroxy(lower)alkyl or both amino and lower alkyl, R.sup.4 carboxy or protected carboxy, provided that R.sup.3 is a heterocyclic group substituted with hydroxy(lower)alkyl or both amino and lower alkyl, when R.sup.2 is lower alkyl, and its pharmaceutically acceptable salt.
具有以下公式的细菌抑制剂头孢烯类化合物及其制备方法:##STR1## 其中,R.sup.1是氨基或受保护的氨基,R.sup.2是低碳基,氨基-(低)-烷基,受保护的氨基-(低)-烷基,羟基-(低)-烷基,受保护的羟基-(低)-烷基,低碳硫基-(低)-烷基,羧基-(低)-烷基,酯化羧基-(低)-烷基,(C.sub.3至C.sub.8)环烷基,低烯基或低炔基,R.sup.3是一种杂环基,其用氨基(低)烷基,受保护的氨基(低)-烷基,羟基(低)烷基或氨基和低碳基取代,R.sup.4是羧基或受保护的羧基,但当R.sup.2是低碳基时,R.sup.3是一种取代有羟基(低)烷基或氨基和低碳基的杂环基,以及其药学上可接受的盐。