tetra(2,2,6,6-tetramethyl-3,5-heptanedionato)zirconium(IV)

• 分子结构分类: 有机化合物 - 有机氧化合物
• 英文名称: tetra(2,2,6,6-tetramethyl-3,5-heptanedionato)zirconium(IV)
• 英文别名: zirconium tetrakis(2,2,6,6-tetramethyl-3,5-heptanedionate)；zirconium(IV) 2,2,6,6-tetramethylheptane-3,5-dionate；zirconium 2,2,6,6-tetramethyl-3,5-heptadionate；zirconium(IV)(2,2,6,6-tetramethyl-3,5-heptanedionate)4；tetrakis(2,2,6,6-tetramethyl-3,5-heptanedionate)Zr(IV)；tetra(dipivaloylmethanate)zirconium(IV)；(Z)-2,2,6,6-tetramethyl-5-oxohept-3-en-3-olate;zirconium(4+)
• 化学式: C₄₄H₇₆O₈Zr
• 分子量: 824.307
• InChiKey: MLSNEJQSDZMDFZ-DNSQIVDOSA-J

计算性质

• 辛醇/水分配系数(LogP)：
  7.57
• 重原子数：
  53
• 可旋转键数：
  12
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.73
• 拓扑面积：
  161
• 氢给体数：
  0
• 氢受体数：
  8

反应信息

• 作为反应物：
  描述：

  tetra(2,2,6,6-tetramethyl-3,5-heptanedionato)zirconium(IV) 以 gas 为溶剂， 生成 zirconium(IV) oxide
  参考文献：
  名称：

  Chemical vapor deposition of nickel-group metals on multiwall carbon nanotubes

  摘要：

  如果通过碳化钛的化学气相沉积（CVD）对纳米管进行预处理，则可以在低温下在多壁碳纳米管（MWCNTs）上实现镍、钯和铂薄膜以及镍/钯和钯/铂双金属薄膜的化学气相沉积（CVD）。在没有预处理的情况下，CVD 会导致形成孤立的镍族金属纳米颗粒。由于与金属的相互作用，金属化的 MWCNT 呈弯曲或扭结状。碳纳米管的初步氧化更容易实现金属化，在这种情况下不会观察到金属化纳米管的弯曲：化学气相沉积、铂、钯、镍、碳、纳米管。

  DOI：

  10.1139/v07-014
• 作为产物：
  描述：

  2,2,6,6-四甲基-3,5-庚二酮 、 氯化锆(IV) 在 NaOH 作用下， 以 乙醇 、 水 为溶剂， 生成 tetra(2,2,6,6-tetramethyl-3,5-heptanedionato)zirconium(IV)
  参考文献：
  名称：

  β-二酮ha（IV）和锆（IV）的热性质

  摘要：

  五种挥发性的β-二酮化（（IV）和锆（IV）：乙酰丙酮ha（IV），三氟乙酰丙酮ha（IV），新戊酰三氟丙酮ha（IV）2,2,6,6-四甲基庚烷3-5获得，纯化和鉴定了-二酸二乙酯和2,2,6,6-四甲基庚烷-3,5-二酸锆（IV）。通过热重法（TG）和差示扫描量热法（DSC）在氦气气氛和真空中研究了固体化合物的热行为。DSC方法也用于定义熔融过程的热力学特征。使用静态方法与石英膜零压力计和流动方法，得到saturated（IV）配合物的饱和蒸气压的温度依赖性。标准热力学特性 ΔH T 0和Δ 小号 Ť 0是从饱和蒸气压的温度依赖性计算升华和蒸发过程的。

  DOI：

  10.1007/s10973-008-9027-x
• 作为试剂：
  描述：

  肉桂酸 、 5-降冰片烯-2-甲醇 在 tetra(2,2,6,6-tetramethyl-3,5-heptanedionato)zirconium(IV) 作用下， 以 xylene 为溶剂， 反应 18.0h， 以88.7%的产率得到cinnamic norbornene methyl ester
  参考文献：
  名称：

  CATALYST COMPOSITION INCLUDING ZIRCONIUM COMPOUNDS FOR ESTERFICATION REACTION AND METHOD FOR PREPARING ESTER COMPOUNDS

  摘要：

  本发明涉及一种酯化催化剂组合物，包括锆化合物，以及一种制备酯化合物的方法，包括使用该组合物酯化醇和羧酸化合物的步骤，可以应用于大规模合成过程。

  公开号：

  US20100280265A1

文献信息

• Organozirconium composite and method of synthesizing the same, raw material solution containing the same, and method of forming lead zirconate titanate thin film
  申请人：MITSUBISHI MATERIALS CORPORATION

  公开号：US20040034245A1

  公开（公告）日：2004-02-19

  The organozirconium composite of the present invention has a decomposition temperature which is near the respective decomposition temperatures of an organolead compound and an organotitanium compound. The raw material solution can precisely control the composition of a PZT thin film over a broad temperature range. The raw material solution is less likely to react an organolead compound even when mixed with the organolead compound. The present invention provides a raw material solution which is less likely to cause vapor phase cracking. The organozirconium composite comprises one, or at least two kinds of zirconium chelate complexes containing, as a ligand, both of a first &bgr; diketone and a second &bgr; diketone having a structure different from that of the first &bgr; diketone, wherein, when at least two kinds of zirconium chelate complexes are contained, the coordination numbers of the first &bgr; diketone and the second &bgr; diketone that coordinate to at least two kinds of zirconium chelate complexes vary depending on the respective zirconium chelate complexes.

  本发明的有机锆复合材料具有接近有机铅化合物和有机钛化合物各自分解温度的分解温度。原料溶液可以精确控制在广泛温度范围内PZT薄膜的组成。即使与有机铅化合物混合，原料溶液也不太可能与有机铅化合物发生反应。本发明提供了一种不太可能导致蒸汽相开裂的原料溶液。有机锆复合材料包括一种或至少两种含有作为配体的第一β-二酮和与第一β-二酮结构不同的第二β-二酮的锆螯合物复合物，其中，当至少两种锆螯合物复合物含有时，第一β-二酮和第二β-二酮的配位数取决于各自的锆螯合物复合物。
• Textured (100) yttria‐stabilized zirconia thin films deposited by plasma‐enhanced chemical vapor deposition
  作者：H. Holzschuh、H. Suhr

  DOI：10.1063/1.105439

  日期：1991.7.22

  deposited by plasma‐enhanced chemical vapor deposition on quartz Si(100), Si(111), Ni, and the steels V2A and hastelloy at substrate temperatures (Ts): 673–873 K. The metal β‐diketonates Y(thd)3 and Zr(thd)4 were used as precursors. The fully stabilized fluorite‐type cubic structure was obtained over a wide range of yttria contents from 3.5 to 80 mol % (Ts=773 K). The quality of the films depended on the

  氧化钇稳定的氧化锆薄膜通过等离子体增强化学气相沉积在石英 Si(100)、Si(111)、Ni 和钢 V2A 和哈氏合金上沉积，衬底温度 (Ts)：673-873 K。金属β-二酮酸盐 Y(thd)3 和 Zr(thd)4 用作前体。在 3.5 至 80 mol % (Ts = 773 K) 的氧化钇含量范围内，获得了完全稳定的萤石型立方结构。薄膜的质量取决于基材和沉积物的热膨胀系数的匹配。
• Ultrasound assisted synthesis of metal-1,3-diketonates
  作者：Nitin S. Nandurkar、Dinkar S. Patil、Bhalchandra M. Bhanage

  DOI：10.1016/j.inoche.2008.03.014

  日期：2008.7

  A simple and convenient methodology for complex formation of wide variety of transition metals/alkaline earth metals with 1,3-diketones under sonication have been reported. The present method showed a significant rate enhancement for metal complex formation in the presence of ultrasound as compared to their silent counterpart, thereby providing higher yields. The role of ultrasound and solvent were also discussed. Moreover, the metal- 1,3-diketonates were characterized by various techniques like FT-IR, (1)H NMR, mass spectrometry and magnetic susceptibility. (c) 2008 Elsevier B.V. All rights reserved.
• Decomposition Behavior of M(DPM)<i>_n</i> (DPM = 2,2,6,6-Tetramethyl-3,5-heptanedionato; <i>n</i> = 2, 3, 4)
  作者：Yinzhu Jiang、Mingfei Liu、Yanyan Wang、Haizheng Song、Jianfeng Gao、Guangyao Meng

  DOI：10.1021/jp064010j

  日期：2006.12.1

  The decomposition behavior of M(DPM)(n) (DPM = 2,2,6,6-tetramethyl-3,5-heptanedionato; M = Sr, Ba, Cu, Sm, Y, Gd, La, Pr, Fe, Co, Cr, Mn, Ce, Zr; n = 2-4) was studied in detail with infrared spectroscopy and mass spectrometry. The results indicated that the chemical bonds in these compounds dissociate generally following the sequence of C-O > M-O > C-C(CH3)(3) > C-C and C-H at elevated temperatures. The decomposition processes of M(DPM) n are strongly influenced by the coordination number and central metal ion radius. In addition, the decomposed products, in air atmosphere, varied from metal oxides to metal carbonates associated with different M(DPM)(n).
• Catalyst Enhanced Chemical Vapor Deposition:  Effects on Chemical Vapor Deposition Temperature and Film Purity
  作者：Yiping Zhang、Sam W.-K. Choi、Richard J. Puddephatt

  DOI：10.1021/ja971588l

  日期：1997.10.1