申请人:Fuji Photo Film Co., LTD.
公开号:US05707776A1
公开(公告)日:1998-01-13
Disclosed is a positive radiation-sensitive resist composition comprising polymer(s) of the following general formula (1) and a radiation-sensitive agent. ##STR1## Ra, Rb, Rc and Rd each are independently a hydrogen atom, a hydroxyl group, a halogen atom, an alkyl group, an alkoxy group, an alkenyl group, an aryl group, an aralkyl group, an alkoxycarbonyl group, an arylcarbonyl group, an acyloxy group, an acyl group, or a cycloalkyl group; k is an integer of from 1 to 30; (1+n) is an integer of from 1 to 100; m is an integer of from 1 to 50; p1, p2 and p3 each are an integer of from 1 to 3; q1 is an integer of from 1 to 4. The resist composition has high resolution to give resist patterns with good profiles and has high heat resistance and good storage stability.
公开了一种正辐射敏感型光阻组合物,包括以下通式(1)的聚合物和辐射敏感剂。##STR1##其中,Ra、Rb、Rc和Rd各自独立地是氢原子、羟基、卤素原子、烷基、烷氧基、烯基、芳基、芳基烷基、烷氧羰基、芳基羰基、酰氧基、酰基或环烷基;k为1至30的整数;(1+n)为1至100的整数;m为1至50的整数;p1、p2和p3各自为1至3的整数;q1为1至4的整数。该光阻组合物具有高分辨率,能够形成具有良好轮廓的光阻图案,并具有高耐热性和良好的储存稳定性。