八氢-2,5-甲桥-2H-茚并[1,2-b]环氧乙烯 | 4292-90-4

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 异戊烯醇脂质
• 中文名称: 八氢-2,5-甲桥-2H-茚并[1,2-b]环氧乙烯
• 中文别名: (5S)-5-甲硫基吗啉-2-羧酸1-氧化
• 英文名称: 9-oxatetracyclo[5.3.1.0.0]undecane
• 英文别名: 1,2-epoxy-hexahydro-4,7-methano-indane；1,2-Epoxy-hexahydro-4,7-methano-indan；Octahydro-2,5-methano-2H-indeno(1,2-b)oxirene；4-oxatetracyclo[6.2.1.02,7.03,5]undecane
• CAS: 4292-90-4
• 化学式: C₁₀H₁₄O
• 分子量: 150.221
• InChiKey: FMWMPEUPRYDXRY-UHFFFAOYSA-N

物化性质

• 沸点：
  233.3±8.0 °C(Predicted)
• 密度：
  1.162±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  2.3
• 重原子数：
  11
• 可旋转键数：
  0
• 环数：
  4.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  12.5
• 氢给体数：
  0
• 氢受体数：
  1

反应信息

• 作为产物：
  描述：

  5,6-二氢二环戊二烯 在 过氧乙酸 作用下， 以 甲苯 为溶剂， 反应 1.0h， 以98.4%的产率得到八氢-2,5-甲桥-2H-茚并[1,2-b]环氧乙烯
  参考文献：
  名称：

  生产脂环族环氧化物的替代方法

  摘要：

  研究了具有中等大小碳环的二环戊烯和不饱和脂环族烃氧化为相应环氧化物的显着和独特的特征。有机氢过氧化物，含水过氧化氢和过酸已被用作氧化剂。已经估计了所考虑的每个氧化过程中底物的反应性，并且选择了提供高环氧化物产率的条件。考虑了每种方法的优缺点，其中考虑了所需产物的分离问题。所获得的结果使得过酸方法被推荐用于二环戊烯环氧化物的合成，这对于实际实施是有效和方便的。

  DOI：

  10.1134/s0965544114030116

文献信息

• (Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it
  申请人：Maeda Katsumi

  公开号：US20070218403A1

  公开（公告）日：2007-09-20

  There are here disclosed a photoresist material for lithography using a light of 220 nm or less which comprises at least a polymer represented by the following formula (2) and a photo-acid generator for generating an acid by exposure: wherein R 1 , R 2 , R 3 and R 5 are each a hydrogen atom or a methyl group; R 4 is an acid-labile group, an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has an acid labile group, an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has a carboxyl group, or a hydrocarbon group having 3 to 13 carbon atoms, which has an epoxy group; R 6 is a hydrogen atom, a hydrocarbon group having 1 to 12 carbon atoms, or an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has a carboxyl group; x, y and z are optional values which meet x+y+z=1, 0

  本文披露了一种光刻用220纳米或以下光的光阻材料，包括至少一种由以下式子（2）表示的聚合物和用于曝光生成酸的光酸发生剂： 其中，R1、R2、R3和R5分别是氢原子或甲基基团；R4是酸敏感基团、具有7至13个碳原子的脂环烃基团、具有酸敏感基团的7至13个碳原子的脂环烃基团、具有3至13个碳原子的环烃基团、具有环氧基团；R6是氢原子、具有1至12个碳原子的碳氢基团或具有7至13个碳原子的脂环烃基团，具有羧基；x、y和z是可选值，满足x+y+z=1，0树脂： 其中，R8是氢原子或甲基基团，R9是具有脂环内酯结构的7至16个碳原子的碳氢基团。
• CATIONICALLY POLYMERIZABLE RESIN COMPOSITION AND CURED OBJECT OBTAINED THEREFROM
  申请人：Funaki Yoshinori

  公开号：US20120077946A1

  公开（公告）日：2012-03-29

  Disclosed is a cationically polymerizable resin composition which includes an oxetane-ring-containing vinyl ether compound (A) and/or an alicyclic-epoxy-containing vinyl ether compound (B); and an oligomer or polymer (C) having a molecular weight of 500 or more, being liquid at 0° C., and containing at least one of structures represented by following Formulae (1a) to (1f), wherein R x represents hydrogen atom or methyl group; R 1 to R 3 each independently represent a hydrocarbon group having 1 to 5 carbon atoms; “a” is an integer of from 0 to 5; and “b” is 1 or 2. This cationically polymerizable resin composition has a low viscosity, is easy to work, cures extremely rapidly upon irradiation with light, and can give a cured object excellent in flexibility, thermal stability, and bendability after heat treatment.

  本发明公开了一种阳离子聚合树脂组合物，包括含氧杂环环氧基乙烯醚化合物（A）和/或含脂环氧基乙烯醚化合物（B）；以及具有分子量为500或更高、在0℃下为液态，并含有下式（1a）至（1f）所表示的结构中至少一种的寡聚物或聚合物（C），其中Rx代表氢原子或甲基基团；R1至R3各自独立地表示具有1至5个碳原子的烃基；“a”为0至5的整数；“b”为1或2。该阳离子聚合树脂组合物具有低粘度、易于加工，经光辐照后固化极快，经热处理后可以给出具有优异的柔性、热稳定性和可弯曲性的固化物。
• (METH)ACRYLATE DERIVATIVE, POLYMER AND PHOTORESIST COMPOSITION HAVING LACTONE STRUCTURE, AND METHOD FOR FORMING PATTERN BY USING IT
  申请人：Maeda Katsumi

  公开号：US20110196122A1

  公开（公告）日：2011-08-11

  There are here disclosed a photoresist material for lithography using a light of 220 nm or less which comprises at least a polymer represented by the following formula (2) and a photo-acid generator for generating an acid by exposure: wherein R 1 , R 2 , R 3 and R 5 are each a hydrogen atom or a methyl group; R 4 is an acid-labile group, an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has an acid labile group, an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has a carboxyl group, or a hydrocarbon group having 3 to 13 carbon atoms, which has an epoxy group; R 6 is a hydrogen atom, a hydrocarbon group having 1 to 12 carbon atoms, or an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has a carboxyl group; x, y and z are optional values which meet x+y+z=1, 0

  本文披露了一种光刻用于220nm或更低波长的光的光阻材料，其包括至少由以下化学式(2)表示的聚合物和用于曝光后生成酸的光酸发生剂：其中，R1、R2、R3和R5分别为氢原子或甲基基团；R4为酸敏感基团、具有7至13个碳原子的脂环烃基团，其具有酸敏感基团、具有7至13个碳原子的脂环烃基团，其具有羧基基团，或具有3至13个碳原子的碳氢基团，其具有环氧基团；R6为氢原子、具有1至12个碳原子的碳氢基团，或具有7至13个碳原子的脂环烃基团，其具有羧基基团；x、y和z是可选值，满足x+y+z=1，0树脂：其中，R8为氢原子或甲基基团，R9为具有脂环内酯结构的7至16个碳原子的碳氢基团。
• RADIATION- OR THERMALLY-CURABLE BARRIER SEALANTS
  申请人：Kong Shengqian

  公开号：US20100164368A1

  公开（公告）日：2010-07-01

  This invention relates to curable sealants that provide low moisture permeability and good adhesive strength after cure. The composition comprises an aromatic compound having meta-substituted reactive groups and a cationic or radical initiator.

  本发明涉及可固化密封剂，其在固化后提供低水分透过率和良好的粘接强度。该组分包括具有间位取代反应基团的芳香化合物和阳离子或自由基引发剂。
• UNDER LAYER FILM-FORMING COMPOSITION FOR IMPRINTS AND METHOD FOR FORMING PATTERN
  申请人：FUJIFILM Corporation

  公开号：US20160009946A1

  公开（公告）日：2016-01-14

  Provided is a composition for forming underlying layer for imprints, which is excellent in surface flatness and adhesiveness. The composition for forming underlying layer for imprints comprises (A) a resin having an ethylenic unsaturated group (P), and a cyclic ether group (T) selected from oxiranyl group and oxetanyl group, and having a weight-average molecular weight of 1000 or larger; and, (B) a solvent.

  提供的是一种用于形成印迹底层的组合物，其表面平整度和粘附性能优良。该用于形成印迹底层的组合物包括（A）一种具有乙烯基不饱和基团（P）和环状醚基团（T）的树脂，所述环状醚基团被选择为环氧基团和环氧乙烷基团，并且具有1000或更大的重均分子量；以及（B）一种溶剂。