1,3-双(甲氧基甲基)-4,5-二甲氧基-2-咪唑啉酮 | 4356-60-9

• 物质功能分类: 有机原料 - 杂环化合物
• 分子结构分类: 有机化合物 - 有机杂环化合物 - 唑烷类
• 中文名称: 1,3-双(甲氧基甲基)-4,5-二甲氧基-2-咪唑啉酮
• 英文名称: 2-Imidazolidinone, 4,5-dimethoxy-1,3-bis(methoxymethyl)-
• 英文别名: 4,5-dimethoxy-1,3-bis(methoxymethyl)imidazolidin-2-one
• CAS: 4356-60-9
• 化学式: C₉H₁₈N₂O₅
• 分子量: 234.25
• InChiKey: ZSSJQYMNCUJSBR-UHFFFAOYSA-N

物化性质

• 沸点：
  316.6±42.0 °C(Predicted)
• 密度：
  1.19±0.1 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  -0.6
• 重原子数：
  16
• 可旋转键数：
  6
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.89
• 拓扑面积：
  60.5
• 氢给体数：
  0
• 氢受体数：
  5

安全信息

• 海关编码：
  2933990090

文献信息

• FLUORINATED SULFONATE ESTERS OF ARYL KETONES FOR NON-IONIC PHOTO-ACID GENERATORS
  申请人：International Business Machines Corporation

  公开号：US20180046077A1

  公开（公告）日：2018-02-15

  Non-ionic photo-acid generating (PAG) compounds were prepared that contain an aryl ketone group having a perfluorinated substituent alpha to the ketone carbonyl. The non-polymeric PAGs release a sulfonic acid when exposed to high energy radiation such as deep UV or extreme UV light. The photo-generated sulfonic acid has a low diffusion rate in an exposed resist layer subjected to a post-exposure bake (PEB) at 100° C. to 150° C., resulting in formation of good line patterns after development. At higher temperatures, the PAGs can also undergo a thermal reaction to form a sulfonic acid. The perfluorinated substituent provides improved thermal stability and hydrolytic/nucleophilic stability.

  非离子型光生酸(PAG)化合物被制备出来，它们含有一个含有全氟取代基的芳酮基团，该取代基位于酮羰基的α位置。这些非聚合PAGs在暴露于高能辐射，如深紫外或极紫外光时，会释放出磺酸。在100°C至150°C的后曝光烘烤(PEB)下，光生成的磺酸在暴露的抵抗层中具有较低的扩散速率，从而在开发后形成良好的线条图案。在较高温度下，PAGs也可以通过热反应形成磺酸。全氟取代基提供了改善的热稳定性和水解/亲核稳定性。
• NON-IONIC ARYL KETONE BASED POLYMERIC PHOTO-ACID GENERATORS
  申请人：International Business Machines Corporation

  公开号：US20180044459A1

  公开（公告）日：2018-02-15

  Non-ionic photo-acid generating (PAG) polymerizable monomers were prepared that contain a side chain sulfonate ester of an alpha-hydroxy aryl ketone. The aryl ketone group has a perfluorinated substituent alpha to the ketone carbonyl. The sulfur of the sulfonate ester is also directly linked to a fluorinated group. PAG polymers prepared from the PAG monomers release a strong sulfonic acid when exposed to high energy radiation such as deep UV or extreme UV light. The photo-generated sulfonic acid has a low diffusion rate in an exposed resist layer subjected to a post-exposure bake (PEB) at 100° C. to 150° C., resulting in formation of good line patterns after development.

  制备了含有α-羟基芳基酮的侧链磺酸酯的非离子光酸发生（PAG）可聚合单体。芳基酮基团在酮基团的α位有全氟取代基。磺酸酯的硫也直接连接到氟化基团。从这些PAG单体制备的PAG聚合物在暴露于高能辐射（如深紫外或极紫外光）时释放出强磺酸。在经过后曝光烘烤（PEB）处理（100°C至150°C）的暴露光刻胶层中，光生成的磺酸扩散速率较低，结果在显影后形成良好的线型图案。
• Fluorine-Containing Sulfonic Acid Salt, Fluorine-Containing Sulfonic Acid Salt Resin, Resist Composition, and Pattern Forming Method Using Same
  申请人：Central Glass Company, Limited

  公开号：US20150198879A1

  公开（公告）日：2015-07-16

  Disclosed is a fluorine-containing sulfonic acid salt resin having a repeating unit represented by the following general formula (3). In the formula, each A independently represents a hydrogen atom, a fluorine atom or a trifluoromethyl group, and n represents an integer of 1-10. W represents a bivalent linking group, R 01 represents a hydrogen atom or a monovalent organic group, and M + represents a monovalent cation. A resist composition containing this resin is further superior in sensitivity, resolution and reproducibility of mask pattern and is capable of forming a pattern with a low LER.

  本公开了一种含氟磺酸盐树脂，其具有以下通用式（3）所代表的重复单元。在该式中，每个A独立地表示氢原子、氟原子或三氟甲基基团，n表示1-10的整数。W表示二价连接基团，R01表示氢原子或一价有机基团，M+表示一价阳离子。含有该树脂的抗蚀组合物在感光性、分辨率和掩膜图案的重现性方面更加优越，并且能够形成具有较低LER的图案。
• Fluorine-Containing Sulfonate Resin, Resist Composition and Pattern Formation Method
  申请人：KATO Misugi

  公开号：US20120322006A1

  公开（公告）日：2012-12-20

  A sulfonate resin according to the present invention has a repeating unit of the following general formula (3): where X each independently represents a hydrogen atom or a fluorine atom; n represents an integer of 1 to 10; R represents a hydrogen atom, a halogen atom or a C 1 -C 3 alkyl or fluorine-containing alkyl group; J represents a divalent linking group; and M + represents a monovalent cation. This sulfonate resin contains a sulfonic acid onium salt in a side chain thereof, with an anion moiety of the sulfonic acid onium salt fixed to the sulfonate resin, and thus functions as a resist resin with good resist characteristics such as DOF, LER, sensitivity and resolution.

  根据本发明，磺酸盐树脂具有以下通用公式（3）的重复单元：其中X分别表示氢原子或氟原子；n表示1至10的整数；R表示氢原子、卤原子或C1-C3烷基或含氟烷基团；J表示二价连接基团；M+表示一价阳离子。这种磺酸盐树脂在侧链中含有磺酸盐鉮盐，磺酸盐鉮盐的阴离子部分固定在磺酸盐树脂上，因此作为具有良好抗性特性（如DOF、LER、灵敏度和分辨率）的抗性树脂。
• NON-IONIC LOW DIFFUSING PHOTO-ACID GENERATORS
  申请人：International Business Machines Corporation

  公开号：US20180044284A1

  公开（公告）日：2018-02-15

  Non-ionic photo-acid generating (PAG) compounds were prepared that contain an aryl ketone group. The disclosed non-polymeric PAGs release a strong sulfonic acid when exposed to high energy radiation such as deep UV or extreme UV light. The photo-generated sulfonic acid has a low diffusion rate in an exposed resist layer subjected to a post-exposure bake (PEB) at 100° C. to 150° C., resulting in formation of good line patterns after development. At higher temperatures, the PAGs undergo a thermal reaction to form a sulfonic acid.

  制备了含芳基酮基团的非离子光酸发生（PAG）化合物。揭示的非聚合物PAG在暴露于高能辐射（如深紫外或极紫外光）时释放出强磺酸。光生磺酸在经过后曝光烘烤（PEB）处理（在100°C至150°C下）的受暴露光阻层中具有低扩散速率，从而在显影后形成良好的线条图案。在较高温度下，PAG会发生热反应形成磺酸。