To provide a metal complex compound capable of being suitably used for manufacturing a metal-containing thin film by the CVD method and a method for preparing a metal-containing thin film.
A metal complex compound comprising a β-diketonato ligand having an alkoxyalkyl-methyl group, and a method for preparing a metal-containing thin film using the metal complex compound by the CVD method.
提供一种
金属配合物化合物,能够适当地用于通过CVD方法制造含
金属薄膜,并提供一种使用该
金属配合物化合物通过CVD方法制备含
金属薄膜的方法。该
金属配合物化合物包括具有烷氧基烷基甲基的
β-二酮配体,而使用该
金属配合物化合物通过CVD方法制备含
金属薄膜的方法。