3-methyl-hexahydro-3,5-methano-cyclopenta[b]furan-2-one | 38335-10-3

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 异戊烯醇脂质
• 英文名称: 3-methyl-hexahydro-3,5-methano-cyclopenta[b]furan-2-one
• 英文别名: 3-Methylhexahydro-2H-3,5-methanocyclopenta[b]furan-2-one；6-methyl-4-oxatricyclo[4.2.1.03,7]nonan-5-one
• CAS: 38335-10-3
• 化学式: C₉H₁₂O₂
• 分子量: 152.193
• InChiKey: ALKDAFQHIOYGJH-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.4
• 重原子数：
  11
• 可旋转键数：
  0
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.89
• 拓扑面积：
  26.3
• 氢给体数：
  0
• 氢受体数：
  2

文献信息

• (Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it
  申请人：Maeda Katsumi

  公开号：US20090023878A1

  公开（公告）日：2009-01-22

  There are here disclosed a photoresist material for lithography using a light of 220 nm or less which comprises at least a polymer represented by the following formula (2) and a photo-acid generator for generating an acid by exposure: wherein R 1 , R 2 , R 3 and R 5 are each a hydrogen atom or a methyl group; R 4 is an acid-labile group, an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has an acid labile group, an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has a carboxyl group, or a hydrocarbon group having 3 to 13 carbon atoms, which has an epoxy group; R 6 is a hydrogen atom, a hydrocarbon group having 1 to 12 carbon atoms, or an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has a carboxyl group; x, y and z are optional values which meet x+y+z=1, 0

  这里披露了一种用于光刻制程的光波长为220nm或更低的光阻材料，其中包括至少由以下式子（2）表示的聚合物和用于曝光生成酸的光酸发生剂： 式中，R1、R2、R3和R5均为氢原子或甲基基团；R4为酸敏基团、具有酸敏基团的7至13个碳原子的脂环烃基团、具有羧基的7至13个碳原子的脂环烃基团或具有环氧基的3至13个碳原子的烃基团；R6为氢原子、具有1至12个碳原子的烃基团或具有羧基的7至13个碳原子的脂环烃基团；x、y和z为可选值，满足x+y+z=1，0树脂： 式中，R8为氢原子或甲基基团，R9为具有脂环内酯结构的7至16个碳原子的烃基团。
• SULFONIUM COMPOUND
  申请人：MASUYAMA Tatsuro

  公开号：US20100248135A1

  公开（公告）日：2010-09-30

  The present invention provides a sulfonium compound represented by the formula (I): wherein Q 1 and Q 2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, R1 represents a C5-C42 organic group having a β-ketoester structure and A + represents an organic counter ion, and a chemically amplified photoresist composition comprising the above-mentioned sulfonium compound and a resin comprising a structural unit having an acid-labile group and being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid.
• METHOD FOR PRODUCING RESIST COPOLYMER HAVING LOW MOLECULAR WEIGHT
  申请人：MARUZEN PETROCHEMICAL CO., LTD.

  公开号：US20130123446A1

  公开（公告）日：2013-05-16

  A method for producing a resist copolymer having a weight-average molecular weight of not less than 3000 and not more than 6000, in which copolymer the contents of an oligomer having a molecular weight of not more than 1000 and a byproduct derived from a polymerization initiator are small, is provided. The method for producing a resist copolymer comprises the step of continuously supplying a solution containing a monomer and a solution containing a polymerization initiator to a heated solvent to carry out a radical polymerization, wherein the variation range of the concentration of the polymerization initiator in polymerization solution is within ±25% of the median value between the maximum concentration and the minimum concentration during specific time; and the variation range of the concentration of unreacted monomer in the polymerization solution is within ±35% of the median value between the maximum concentration and the minimum concentration during specific time.
• ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM, METHOD OF FORMING PATTERN USING THE COMPOSITION, PROCESS FOR MANUFACTURING ELECTRONIC DEVICE AND ELECTRONIC DEVICE
  申请人：FUJIFILM Corporation

  公开号：US20140212814A1

  公开（公告）日：2014-07-31

  Provided is an actinic-ray- or radiation-sensitive resin composition, including any of compounds of general formula (1) below that when exposed to actinic rays or radiation, is decomposed to thereby generate an acid and a resin that when acted on by an acid, is decomposed to thereby increase its solubility in an alkali developer.
• ACTINIC RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY- OR RADIATION-SENSITIVE FILM AND METHOD OF FORMING PATTERN
  申请人：FUJIFILM Corporation

  公开号：US20140234759A1

  公开（公告）日：2014-08-21

  According to one embodiment, there is provided an actinic ray- or radiation-sensitive resin composition containing (A) a resin containing a repeating unit represented by general formula (1) below and a repeating unit that is decomposed by an action of an acid to generate an alkali-soluble group, and (B) a compound that generates the acid when exposed to actinic rays or radiation, where L represents a bivalent connecting group, R 1 represents a hydrogen atom or an alkyl group, and Z represents a cyclic acid anhydride structure.