Photoacid generator, chemically amplified resist composition including the same, and associated methods
申请人:Kang Yool
公开号:US20090131684A1
公开(公告)日:2009-05-21
A photoacid generator represented by Formula 1 or Formula 2:
wherein R
1
, R
2
, and R
3
are each independently a C1-C10 alkyl group, X is a C3-C20 alicyclic hydrocarbon group forming a ring with S
+
, and at least one CH
2
group in the alicyclic hydrocarbon group may be replaced with at least one selected from the group consisting of S, O, NH, a carbonyl group, and R
5
—S
+
A
−
, where R
5
is a C1-C10 alkyl group, and A
−
is a counter-ion.
由Formula 1或Formula 2表示的光酸发生剂:
其中R1、R2和R3分别独立地是C1-C10烷基基团,X是一个与S+形成环的C3-C20脂环烃基团,并且脂环烃基团中的至少一个CH2基团可以被来自S、O、NH、一个羰基和R5—S+A−组成的群体中的至少一个所取代,其中R5是一个C1-C10烷基基团,A−是一个对离子。