Resist composition, method of forming resist pattern, polymeric compound, and compound
申请人:TOKYO OHKA KOGYO CO., LTD.
公开号:US11061329B2
公开(公告)日:2021-07-13
A resist composition including a resin component having a structural unit derived form a compound represented by formula (a0-1) (in the formula, W represents a polymerizable group-containing group; Ra01 is a group which is bonded to Ra03 to form an aliphatic cyclic group, or bonded to Ra04 to form an aliphatic cyclic group;
Ra02 represents a hydrocarbon group which may have a substituent; Ra03 is a hydrogen atom or a monovalent organic group in the case where Ra01 is not bonded thereto; Ra04 is a hydrogen atom or a monovalent organic group in the case where Ra01 is not bonded thereto; and Ra05 to Ra07 each independently represents a hydrogen atom or a monovalent organic group).
一种抗蚀剂组合物,包括一种树脂组分,其结构单元衍生自式(a0-1)所代表的化合物(式中,W 代表含可聚合基团的基团;Ra01 是与 Ra03 键合形成脂肪族环状基团的基团,或与 Ra04 键合形成脂肪族环状基团的基团;
Ra02 代表可能具有取代基的烃基;Ra03 是氢原子或一价有机基团(在 Ra01 未与之键合的情况下);Ra04 是氢原子或一价有机基团(在 Ra01 未与之键合的情况下);以及 Ra05 至 Ra07 各自独立地代表氢原子或一价有机基团)。