N,N'-bis(2-aminoethyl)-butane-1,4-diamine | 35513-90-7

• 物质功能分类: 有机原料 - 氨基化合物 - 无环单胺、多胺及其衍生物和盐
• 分子结构分类: 有机化合物 - 有机氮化合物
• 英文名称: N,N'-bis(2-aminoethyl)-butane-1,4-diamine
• 英文别名: N,N'-bis(2-aminoethyl)-1,4-diaminobutane；1,4,9,12-tetraazadodecane；N,N'-bis(2-aminoethyl)-1,4-butanediamine；N,N'-Bis-(2-aminoethyl)-butan-1,4-diamin；N,N'-bis(2-aminoethyl)butane-1,4-diamine
• CAS: 35513-90-7
• 化学式: C₈H₂₂N₄
• 分子量: 174.289
• InChiKey: ODBJKENDOPPIFT-UHFFFAOYSA-N

物化性质

• 沸点：
  306.4±10.0 °C(Predicted)
• 密度：
  0.939±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  -1.8
• 重原子数：
  12
• 可旋转键数：
  9
• 环数：
  0.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  76.1
• 氢给体数：
  4
• 氢受体数：
  4

制备方法与用途

精胺（Spermine）是一种存在于所有真核细胞中的多胺类物质，呈碱性，在生理pH值下以多质子化的形式存在。

反应信息

• 作为反应物：
  描述：

  anthracene-1,9-dicarboxylic acid anhydride 、 N,N'-bis(2-aminoethyl)-butane-1,4-diamine 以 甲苯 为溶剂， 反应 4.0h， 以40%的产率得到15-[2-[4-[2-(14,16-Dioxo-15-azatetracyclo[7.7.1.02,7.013,17]heptadeca-1(17),2,4,6,8,10,12-heptaen-15-yl)ethylamino]butylamino]ethyl]-15-azatetracyclo[7.7.1.02,7.013,17]heptadeca-1(17),2,4,6,8,10,12-heptaene-14,16-dione
  参考文献：
  名称：

  发色团修饰的双萘酰亚胺：双-二苯并[de，h]异喹啉-1,3-二酮的合成及抗肿瘤活性。

  摘要：

  bis-dibenz [de，h]异喹啉-1,3-二酮是一系列新的抗肿瘤药物，由两个被烷基氨基接头桥接的生色团组成。在本研究中，我们探讨了存在两个带有不同多胺链的二苯并[de，h]异喹啉-1,3-二酮部分对细胞毒性的影响。具有桥（CH2）2-NH-（CH2）n-NH-（CH2）2（其中n = 2-5）的Bis-dibenz [de，h]异喹啉-1,3-二酮显示最佳的细胞毒性，IC50约为10 nM。具有（CH2）2-NH-（CH2）3-NH-（CH2）2桥的化合物16在大约5 microM处改变了DNA迁移率以及拓扑异构酶I和II的活性。当在体内进行测试时，化合物16以154％的最佳％T / C增加了植入M5076的小鼠的中位生存时间，并在植入Lox黑素瘤的50％的小鼠中产生了治愈作用。

  DOI：

  10.1021/jm960295k
• 作为产物：
  描述：

  N,N'-butanediyl-bis-glycine dinitrile 在 lithium aluminium tetrahydride 、 硫酸 作用下， 以 四氢呋喃 为溶剂， 生成 N,N'-bis(2-aminoethyl)-butane-1,4-diamine
  参考文献：
  名称：

  多胺XIV。含两个乙二胺残基的线性四胺的质子平衡

  摘要：

  描述了直链四胺H 2 N（CH 2）2 NH（CH 2）2 NH（CH 2）2 NH 2（n = 4和5）的合成。使用电位和量热法研究了n = 2、3、4、5、6和8的同源四胺以及N-甲基乙二胺的质子化。考虑到取代基对氨基N原子碱性的影响，讨论了获得的结果。

  DOI：

  10.1002/hlca.19820650115

文献信息

• Process for the Synthesis of N-substituted Cyclic Alkylene Ureas
  申请人：Cytec Technology Corp.

  公开号：EP2548869A1

  公开（公告）日：2013-01-23

  The invention relates to a process for the synthesis of N-substituted cyclic alkylene ureas by reacting a multifunctional aliphatic amine A having at least two amino groups which may be primary or secondary, at least one of which is a primary amino group, -NH2, and at least one of which is a secondary amino group, >NH, the other hydrogen group whereof having been substituted by a hydrocarbyl group which in turn may be substituted by a hydroxyl group, or an amino group, or a carboxyl group, or a ketone carbonyl group, or a hydrazide or hydrazone group, or a mercaptan group, and at least one further functional group selected from the group consisting of primary or secondary amino groups and hydroxyl groups, and an aliphatic organic carbonate component C selected from the group consisting of dialkyl carbonates CD and of alkylene carbonates CA.

  本发明涉及一种合成N-取代环状烷基脲的方法，该方法通过反应一种具有至少两个氨基的多功能脂肪族胺A来实现，其中至少一个是一级氨基-NH2，至少一个是二级氨基->NH，其它氢原子被烃基取代，该烃基又可以被羟基、氨基、羧基、酮羰基、肼或肼酮基、巯基取代，同时还包括至少一种来自于一级或二级氨基与羟基的功能基团，以及一种来自于脂肪族有机碳酸酯组分C的反应，该组分C选自双烷基碳酸酯CD和烷基碳酸酯CA的组合。
• [EN] PROCESS FOR THE SYNTHESIS OF N-SUBSTITUTED CYCLIC ALKYLENE UREAS<br/>[FR] PROCÉDÉ POUR LA SYNTHÈSE D'ALKYLÈNE-URÉES N-SUBSTITUÉES CYCLIQUES
  申请人：CYTEC TECH CORP

  公开号：WO2013012995A1

  公开（公告）日：2013-01-24

  The invention relates to a process for the synthesis of N-substituted cyclic alkylene ureas by reacting a multifunctional aliphatic amine A having at least two amino groups which may be primary or secondary, at least one of which is a primary amino group, -NH2, and at least one of which is a secondary amino group, >NH, the other hydrogen group whereof having been substituted by a hydrocarbyl group which in turn may be substituted by a hydroxyl group, or an amino group, or a carboxyl group, or a ketone carbonyl group, or a hydrazide or hydrazone group, or a mercaptan group, and at least one further functional group selected from the group consisting of primary or secondary amino groups and hydroxyl groups, and an aliphatic organic carbonate component C selected from the group consisting of dialkyl carbonates CD and of alkylene carbonates CA.

  本发明涉及一种合成N-取代的环烷基脲的方法，包括将至少具有两个氨基团的多功能脂肪族胺A进行反应，其中至少一个是一级氨基团-NH2，至少一个是二级氨基团->NH，其它氢原子已被烃基取代，该烃基又可以被羟基、氨基、羧基、酮羰基、肼或肼酮基、巯基取代，同时还具有来自于一级或二级氨基团和羟基团的至少一个进一步的功能团，以及从二烷基碳酸酯CD和烷基碳酸酯CA组成的脂肪族有机碳酸酯组分C进行反应。
• Heteroalkylene-bis-anthraquinones
  申请人：AMERICAN CYANAMID COMPANY

  公开号：EP0042940A1

  公开（公告）日：1982-01-06

  Anthraquinones of the formula: wherein Q is a divalent moiety, A is -(CH2)nX(CH2)p-, X is selected from the group consisting of R is hydrogen or hydroxy, R1 and R2 are each individually selected from the group consisting of hydrogen, alkyl having from 1 to 4 carbon atoms and monohydroxyalkyl having from 2 to 4 carbon atoms, wherein the carbon atom alpha to the nitrogen atom may not bear a hydroxyl group, and R3 is hydrogen or lower alkyl (C1-C3); and pharmaceutically acceptable acid-addition salts thereof, useful as chelating agents and for inhibiting the growth of transplanted mouse tumors.

  式中的蒽醌类化合物： 其中 Q 为二价分子，A 为-(CH2)nX(CH2)p-，X 选自由下列各项组成的组 R是氢或羟基，R1和R2各自单独选自由氢、具有1至4个碳原子的烷基和具有2至4个碳原子的单羟烷基组成的组，其中氮原子α端的碳原子不得带有羟基，R3是氢或低级烷基（C1-C3）；及其药学上可接受的酸加成盐，可用作螯合剂和抑制移植小鼠肿瘤的生长。
• ABRASIVE FOR SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE, METHOD FOR POLISHING SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE AND SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE MANUFACTURING METHOD
  申请人：Asahi Glass Company, Limited

  公开号：EP1860688A1

  公开（公告）日：2007-11-28

  To provide a polishing technique with which in production of a semiconductor integrated circuit device, when a plane to be polished is polished, an appropriate polishing rate ratio of a polysilicon film to another material can be obtained, whereby high level planarization of a plane to be polished including a polysilicon film can be realized. A polishing compound for chemical mechanical polishing, containing cerium oxide particles, a water-soluble polyamine and water and having a pH within a range of from 10 to 13, is used.

  提供一种抛光技术，在生产半导体集成电路器件时，当对待抛光平面进行抛光时，可获得多晶硅薄膜与另一种材料的适当抛光率比，从而实现包括多晶硅薄膜在内的待抛光平面的高水平平面化。 使用的化学机械抛光用抛光剂含有氧化铈颗粒、水溶性多胺和水，pH 值在 10 至 13 之间。
• ABRASIVE FOR SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE, METHOD OF POLISHING THEREWITH AND PROCESS FOR PRODUCING SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE
  申请人：Asahi Glass Company, Limited

  公开号：EP1865546A1

  公开（公告）日：2007-12-12

  To provide a technique employed when a plane to be polished of a silicon dioxide type material layer is polished in production of a semiconductor integrated circuit device, which is capable of polishing protruded portions by priority while suppressing polishing at recessed portions and planarizing the plane to be polished at a high level with an extremely small polishing amount, with small pattern dependence of the polishing rate. In production of a semiconductor integrated circuit device, when a plane to be polished is a plane to be polished of a silicon dioxide type material layer, a polishing compound containing cerium oxide particles, a water-soluble polyamine and water is used as a polishing compound for chemical mechanical polishing to polish the plane to be polished.

  提供一种在生产半导体集成电路器件时抛光二氧化硅类材料层的待抛光平面时使用的技术，该技术能够优先抛光突出部分，同时抑制凹陷部分的抛光，并以极小的抛光量使待抛光平面高度平面化，抛光速率的图案依赖性很小。 在半导体集成电路设备的生产中，当待抛光平面是二氧化硅类材料层的待抛光平面时，使用含有氧化铈颗粒、水溶性多胺和水的抛光剂作为化学机械抛光的抛光剂来抛光待抛光平面。