In an attempt to evaluate the steric effect of ortho methyl groups on the stability of the cumyl radical, 2,2',4,4',6,6'-hexamethylazocumene (6) was synthesized and its rate of decomposition was measured. The fact that 6 decomposes 40 times faster than azocumene is attributed to a ground state steric effect. Calculations on the mesitylcumyl radical 1 and cation 2 show both systems to be substantially nonplanar with dihedral angles of 48 degrees and 35 degrees, respectively. Calculated charge distributions for cation 2 corroborate previously obtained NMR results which showed substantial loss of charge delocalization.(1)
In an attempt to evaluate the steric effect of ortho methyl groups on the stability of the cumyl radical, 2,2',4,4',6,6'-hexamethylazocumene (6) was synthesized and its rate of decomposition was measured. The fact that 6 decomposes 40 times faster than azocumene is attributed to a ground state steric effect. Calculations on the mesitylcumyl radical 1 and cation 2 show both systems to be substantially nonplanar with dihedral angles of 48 degrees and 35 degrees, respectively. Calculated charge distributions for cation 2 corroborate previously obtained NMR results which showed substantial loss of charge delocalization.(1)
Conformational Studies by Dynamic NMR. 83.<sup>1</sup> Correlated Enantiomerization Pathways for the Stereolabile Propeller Antipodes of Dimesityl Substituted Ethanol and Ethers
produced good agreement between the computed and experimental barrier for a correlated dynamic process where a disrotatory one-ring flip pathway reverses the helicity of the conformational enantiomers. Introduction of a configurationally stable chiralcenter allowed two distinct NMR spectra to be detected at appropriate low temperature for two stereolabile diastereoisomers.
CHEMICALLY AMPLIFIED RESIST MATERIAL, PATTERN-FORMING METHOD, COMPOUND, AND PRODUCTION METHOD OF COMPOUND
申请人:OSAKA UNIVERSITY
公开号:EP3133444A1
公开(公告)日:2017-02-22
A chemically amplified resist material of the present invention is used in a process including: patternwise exposing a predetermined region of resist material film to ionizing radiation or nonionizing radiation; floodwise exposing the resist material film patternwise exposed to nonionizing radiation; baking the resist material film floodwise exposed; and developing resist material film to form a resist pattern, the chemically amplified resist material containing: (1) base component; and (2) a component that is capable of generating a radiation-sensitive sensitizer and an acid upon an exposure, wherein the component (2) contains, among (a) a radiation-sensitive acid-and-sensitizer generating agent, (b) a radiation-sensitive sensitizer generating agent, and (c) a radiation-sensitive acid generating agent: the components (a) and (b); the components (b) and (c); or all of the components (a) to (c), and wherein the component (b) contains a compound represented by formula (A).
作者:Jack W. Timberlake、Dawei Pan、Jane Murray、Branko S. Jursic、Tonghua Chen
DOI:10.1021/jo00121a057
日期:1995.8
In an attempt to evaluate the steric effect of ortho methyl groups on the stability of the cumyl radical, 2,2',4,4',6,6'-hexamethylazocumene (6) was synthesized and its rate of decomposition was measured. The fact that 6 decomposes 40 times faster than azocumene is attributed to a ground state steric effect. Calculations on the mesitylcumyl radical 1 and cation 2 show both systems to be substantially nonplanar with dihedral angles of 48 degrees and 35 degrees, respectively. Calculated charge distributions for cation 2 corroborate previously obtained NMR results which showed substantial loss of charge delocalization.(1)