A nickel-catalyzed tandem reaction involving cyclic esterification/C–S bond formation for synthesizing 5-oxa-11-thia-benzofluoren-6-ones
作者:Rongrong Cai、Qicai Wei、Runsheng Xu
DOI:10.1039/d0ra04367b
日期:——
A nickel-catalyzed tandemreaction involving cyclic esterification/C–S bond formation has been developed. Starting from samples containing 3-(2-hydroxy-phenyl)-acrylic acids with 2-halide-benzenethiols, versatile biologically active 5-oxa-11-thia-benzofluoren-6-one compounds were efficiently synthesized in good to high yields. This new methodology provides an economical approach toward C–S bond formation
BASE GENERATOR, PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING MATERIAL COMPRISING THE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD USING THE PHOTOSENSITIVE RESIN COMPOSITION AND PRODUCTS COMPRISING THE SAME
申请人:Katayama Mami
公开号:US20120070781A1
公开(公告)日:2012-03-22
An object of the present invention is to provide a base generator which has sensitivity and is applicable to a wide range of applications, and a photosensitive resin composition which is applicable to a wide range of applications due to the structure of a polymer precursor in which reaction into a final product is promoted by a basic substance or by heating in the presence of a basic substance. The base generator generates a base by exposure to electromagnetic radiation and heating. The photosensitive resin composition comprises a polymer precursor in which reaction into a final product is promoted by the base generator and a basic substance or by heating in the presence of a basic substance.
Base generator, photosensitive resin composition, pattern forming material comprising the photosensitive resin composition, pattern forming method using the photosensitive resin composition and products comprising the same
申请人:Katayama Mami
公开号:US08697332B2
公开(公告)日:2014-04-15
An object of the present invention is to provide a base generator which has sensitivity and is applicable to a wide range of applications, and a photosensitive resin composition which is applicable to a wide range of applications due to the structure of a polymer precursor in which reaction into a final product is promoted by a basic substance or by heating in the presence of a basic substance. The base generator generates a base by exposure to electromagnetic radiation and heating. The photosensitive resin composition comprises a polymer precursor in which reaction into a final product is promoted by the base generator and a basic substance or by heating in the presence of a basic substance.
A main object of the present invention is to provide a TFT substrate having excellent switching characteristics. The object is attained by providing a thin film transistor substrate comprising: a substrate, and a thin film transistor having an oxide semiconductor layer that is formed on the substrate and is formed from an oxide semiconductor, and a semiconductor layer-adjoining insulating layer formed to be in contact with the oxide semiconductor layer, wherein at least one semiconductor layer-adjoining insulating layer included in the thin film transistor is a photosensitive polyimide insulating layer formed by using a photosensitive polyimide resin composition.