The present invention provides a polymerizable compound having an alicyclic structure and a polymerizable group and represented by the general formula (1) or (19). The polymerizable compound exhibits high adhesion to substrates, reduced swelling during development, a reduced amount of water absorption during exposure in water, and high dry-etching resistance. Also provided are a polymer of such a polymerizable compound, a process for producing the same and a photoresist composition containing the polymer.
本发明提供了一种具有脂环族结构和可聚合基团并由通式(1)或(19)表示的可聚合化合物。这种可聚合化合物对基材有很高的附着力,在显影过程中可减少膨胀,在
水中暴露时可减少吸
水量,并具有很高的耐干蚀性。此外,还提供了这种可聚合化合物的聚合物、生产这种聚合物的工艺以及含有这种聚合物的光刻胶组合物。