NOVEL ALICYCLIC ESTER COMPOUND, AND (METH)ACRYLIC COPOLYMER AND PHOTOSENSITIVE RESIN COMPOSITION CONTAINING SAME
申请人:Mitsubishi Gas Chemical Company, Inc.
公开号:EP2990425A1
公开(公告)日:2016-03-02
[Problem to be solved]
The present invention provides, as a chemically amplified resist, a well-balanced resist or compound which results in improved sensitivity, resolution and line edge roughness (LER) without impairing the fundamental physical properties required as a resist (e.g., pattern shape, dry etching resistance, heat resistance).
[Means to solve the problem]
A mixture of cycloaliphatic ester compounds represented by general formulae (1) to (3), and a process for preparation thereof, as well as a (meth)acrylic copolymer comprising the cycloaliphatic ester compounds of general formulae (1) to (3) and a photosensitive resin composition thereof.
[有待解决的问题]
本发明作为一种化学放大抗蚀剂,提供了一种平衡良好的抗蚀剂或化合物,它能提高灵敏度、分辨率和线边缘粗糙度(LER),而不损害作为抗蚀剂所需的基本物理特性(如图案形状、耐干蚀性、耐热性)。
[解决问题的方法]
通式(1)至(3)表示的环脂族酯化合物的混合物及其制备方法,以及由通式(1)至(3)的环脂族酯化合物组成的(甲基)丙烯酸共聚物及其感光树脂组合物。