申请人:——
公开号:US20030171304A1
公开(公告)日:2003-09-11
The invention relates to compounds of the formula I
1
R
1
is H, A, Ar, Hal, —OH, —O—A, —CF
3
or —OCF
3
;
R
2
and R
7
are H or A;
R
3
is
2
R
4
, R
5
and R
6
are in each case, independently of each other, H, A, Hal, —OH, —O—A, —CF
3
, —OCF
3
, —CN, —NH
2
, —A—NH
2
;
A is C
1
-C
6
-alkyl;
Ar is a substituent which is formed by an aromatic radical which is optionally substituted once, twice or three times by R
5
and which has from 1 to 3 ring structures which are optionally fused with other ring structures to form a fused ring system;
Het is a substituent which is formed by a heterocycle which has from 1 to 3 ring structures, with each ring structure being saturated, unsaturated or aromatic and being optionally fused with other ring structures to form a fused ring system, and the heterocycle possessing a total of from 1 to 4 N, O and/or S atoms in the ring structures and being optionally substituted by R
6
;
Hal is F, Cl, Br or I;
n is 2, 3, 4, 5 or 6
and to their use.
本发明涉及公式I1的化合物:
其中,R1为H,A,Ar,Hal,—OH,—O—A,—CF3或—OCF3;R2和R7为H或A;R3为2R4,R5和R6,每个独立地为H,A,Hal,—OH,—O—A,—CF3,—OCF3,—CN,—NH2,—A—NH2;A为C1-C6烷基;Ar为取代基,由一芳香基团形成,该芳香基团可选地一次、两次或三次取代R5,并且具有1-3个环结构,这些环结构可选地与其他环结构融合形成融合环系统;Het为取代基,由一个杂环组成,该杂环具有1-3个环结构,每个环结构饱和、不饱和或芳香,并且可选地与其他环结构融合形成融合环系统,该杂环在环结构中具有1-4个N、O和/或S原子,并且可选地被R6取代;Hal为F、Cl、Br或I;n为2、3、4、5或6,并且涉及它们的用途。