3-(3-methylcyclohexyl)butan-1-ol | 1023288-27-8

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 异戊烯醇脂质
• 英文名称: 3-(3-methylcyclohexyl)butan-1-ol
• CAS: 1023288-27-8
• 化学式: C₁₁H₂₂O
• 分子量: 170.295
• InChiKey: HURQJMQJQXLCJE-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.7
• 重原子数：
  12
• 可旋转键数：
  3
• 环数：
  1.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  20.2
• 氢给体数：
  1
• 氢受体数：
  1

反应信息

• 作为反应物：
  描述：

  3-(3-methylcyclohexyl)butan-1-ol 在 戴斯-马丁氧化剂 作用下， 以 二氯甲烷 、 水 为溶剂， 反应 2.0h， 以28%的产率得到3-(3-methylcyclohexyl)butanal
  参考文献：
  名称：

  WO2008/53148

  摘要：

  公开号：
• 作为产物：
  描述：

  3-(3-methylphenyl)butanal 在 Ru/Al2O3 氢气 作用下， 130.0 ℃ 、6.5 MPa 条件下， 反应 5.5h， 以76%的产率得到3-(3-methylcyclohexyl)butan-1-ol
  参考文献：
  名称：

  WO2008/53148

  摘要：

  公开号：

文献信息

• Novel Fragrance Compounds
  申请人：Fortineau Anne Dominique

  公开号：US20100069287A1

  公开（公告）日：2010-03-18

  A compound having the structure (A) where R1 is C1 to C5 alkyl, and R2 to R5 are independently selected from H and methyl, having a strong odour and for use as a perfumery ingredient, particularly in Muguet accords/fragrances, is provided.

  提供一种具有结构（A）的化合物，其中R1为C1至C5烷基，R2至R5分别独立选择H和甲基，具有强烈的气味，用作香料成分，特别是在鸢尾花香调/香水中。
• NOVEL FRAGRANCE COMPOUNDS
  申请人：Givaudan Nederland Services B.V.

  公开号：EP2077986A1

  公开（公告）日：2009-07-15
• Oxime Compound and Resist Composition Containing the Same
  申请人：MASUYAMA Tatsuro

  公开号：US20100021847A1

  公开（公告）日：2010-01-28

  An oxime compound represented by the formula (I): wherein Y represents an unsubstituted or substituted n-valent C6-C14 aromatic hydrocarbon group, n represents an integer of 1 to 6, R 1 ) represents a C1-C30 aliphatic hydrocarbon group etc., R 2 represents a linear or branched chain C1-C20 aliphatic hydrocarbon group etc., W represents —CO—O— etc., Q 1 and Q 2 each independently represent a fluorine atom etc., Z represents a C1-C20 halogenated aliphatic hydrocarbon group etc, and the resist composition containing the same.
• SULFONIUM COMPOUND
  申请人：MASUYAMA Tatsuro

  公开号：US20100248135A1

  公开（公告）日：2010-09-30

  The present invention provides a sulfonium compound represented by the formula (I): wherein Q 1 and Q 2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, R1 represents a C5-C42 organic group having a β-ketoester structure and A + represents an organic counter ion, and a chemically amplified photoresist composition comprising the above-mentioned sulfonium compound and a resin comprising a structural unit having an acid-labile group and being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid.
• COMPOUND AND PHOTORESIST COMPOSITION CONTAINING THE SAME
  申请人：Masuyama Tatsuro

  公开号：US20110039209A1

  公开（公告）日：2011-02-17

  The present invention provides a compound represented by the formula (C1): wherein R c2 represents a C6-C10 aromatic hydrocarbon group having at least one nitro group and R c1 represents a group represented by the formula (1): wherein R c4 represents a hydrogen atom etc., R c5 represents a C1-C30 divalent hydrocarbon group, and R c3 represents a group represented by the formula (3-1), (3-2) or (3-3): wherein R c6 , R c7 , R c8 , R c9 , R c10 , R c11 , R c12 , R c13 and R c14 each independently represent a C1-C30 hydrocarbon group, and a photoresist composition comprising a resin, an acid generator and the compound represented by the formula (C1).