chloroethanoic acid hexahydro-2-keto-3,5-methylene-2H-cyclopenta[b]furan-6-yl ester | 869795-96-0

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 异戊烯醇脂质
• 英文名称: chloroethanoic acid hexahydro-2-keto-3,5-methylene-2H-cyclopenta[b]furan-6-yl ester
• 英文别名: chloroacetic acid hexahydro-2-oxo-3,5-methano-2H-cyclopenta[b]furan-6-yl ester；hexahydro-2-oxo-3,5-methano-2H-cyclopenta[b]furan-6-yl chloroacetate；Acetic acid, 2-chloro-, hexahydro-2-oxo-3,5-methano-2H-cyclopenta[b]furan-6-yl ester；(5-oxo-4-oxatricyclo[4.2.1.03,7]nonan-2-yl) 2-chloroacetate
• CAS: 869795-96-0
• 化学式: C₁₀H₁₁ClO₄
• 分子量: 230.648
• InChiKey: OEXQELSYHWMKGJ-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.3
• 重原子数：
  15
• 可旋转键数：
  3
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.8
• 拓扑面积：
  52.6
• 氢给体数：
  0
• 氢受体数：
  4

反应信息

• 作为反应物：
  描述：

  chloroethanoic acid hexahydro-2-keto-3,5-methylene-2H-cyclopenta[b]furan-6-yl ester 在 potassium carbonate 、 potassium iodide 作用下， 以 氯仿 、 N,N-二甲基甲酰胺 为溶剂， 反应 7.0h， 生成
  参考文献：
  名称：

  塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法

  摘要：

  【题目】提供可以制造具有良好的掩模误差因子（MEF）的光刻胶图案的盐、包含该盐的酸发生剂以及包含该剂的光刻胶组合物。 【解决方案】例如，提供由下式表示的（I-17）合成的盐。【选择图】无。

  公开号：

  JP2021175728A

文献信息

• SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME
  申请人：ICHIKAWA Koji

  公开号：US20100304294A1

  公开（公告）日：2010-12-02

  A salt represented by the formula (I-AA): wherein Q 1 and Q 2 each independently represent a fluorine atom or a C1-C4 perfluoroalkyl group, X 1 represents a single bond etc., Y 1 represents a C1-C36 aliphatic hydrocarbon group etc., A 1 and A 2 independently each represents a C1-C20 aliphatic hydrocarbon group etc., Ar 1 represents a (m 4 +1)-valent C6-C20 aromatic hydrocarbon group which can have one or more substituents, B 1 represents a single bond etc., m 1 and m 2 independently each represents an integer of 0 to 2, m 3 represents an integer of 1 to 3, with the proviso that m 1 plus m 2 plus m 3 equals 3, and m 4 represents an integer of 1 to 3, and a photoresist composition comprising the salt represented by the formula (I-AA) and a resin comprising a structural unit having an acid-labile group and being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid.

  公式(I-AA)表示的盐，其中Q1和Q2各自独立代表一个氟原子或一个C1-C4全氟烷基团，X1代表一个单一键等，Y1代表一个C1-C36脂肪烃团等，A1和A2各自独立代表一个C1-C20脂肪烃团等，Ar1代表一个(m4+1)价的C6-C20芳香烃团，该团可以有一个或多个取代基，B1代表一个单一键等，m1和m2各自独立代表一个从0到2的整数，m3代表一个从1到3的整数，条件是m1加上m2加上m3等于3，m4代表一个从1到3的整数，以及包含由公式(I-AA)表示的盐的光阻剂组合物，以及包含具有酸不稳定基团且在碱性水溶液中不溶或微溶但在酸作用下变得可溶的结构单元的树脂。
• SALT, PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN
  申请人：YOSHIDA Isao

  公开号：US20130052588A1

  公开（公告）日：2013-02-28

  A photoresist composition containing a resin that is hardly soluble or insoluble, but which is soluble in an aqueous alkali solution by action of an acid, and a salt represented by formula (I): wherein Q 1 , Q 2 , L 1 , W 1 , W 2 , R 1 , R 2 , t1 and t2 are defined in the specification, and Z + represents an organic cation.

  一种光刻胶组合物，包含一种树脂，该树脂几乎不溶解或不溶解，但在酸的作用下可溶解于水性碱溶液中，并且包含由式(I)表示的盐：其中Q1、Q2、L1、W1、W2、R1、R2、t1和t2在规范中定义，Z+代表有机阳离子。
• Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same
  申请人：Yoshida Isao

  公开号：US20080076063A1

  公开（公告）日：2008-03-27

  A salt represented by the formula (I): wherein X represents a C1-C12 divalent linear or branched chain hydrocarbon group, Y represents a C1-C30 hydrocarbon group which may be substituted with at least one substituent, and at least one —CH 2 — in the C1-C30 hydrocarbon group may be substituted with —O— or —CO—, Q 1 and Q 2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, and A + represents an organic counter ion. The present invention further provides a chemically amplified resist composition comprising the salt represented by the above-mentioned formula (I).

  一种由以下式表示的盐（I）：其中X代表一个C1-C12二价线性或支链碳氢链，Y代表一个C1-C30碳氢基团，该基团可能被至少一个取代基取代，C1-C30碳氢基团中至少一个—CH2—可能被—O—或—CO—取代，Q1和Q2各自独立地代表一个氟原子或一个C1-C6全氟烷基基团，A+代表一个有机对离子。本发明还提供了一种包含上述式（I）所表示的盐的化学增感抗剂组合物。
• Chemically amplified positive resist composition
  申请人：Takemoto Ichiki

  公开号：US20060160017A1

  公开（公告）日：2006-07-20

  The present invention provides a chemically amplified positive resist composition comprising (i) a polymer which is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid, (ii) an acid generator, and (iii) a compound of the formula (I). The present invention also provides an ester derivative useful as a component of the chemically amplified positive resist composition, and process for producing the ester derivative.

  本发明提供了一种化学增感正性光刻胶组合物，包括(i)一种在碱性水溶液中不溶或难溶，但在酸的作用下变为可溶于碱性水溶液的聚合物，(ii)一种酸发生剂，以及(iii)式(I)的化合物。本发明还提供了一种酯衍生物，可用作化学增感正性光刻胶组合物的组分，以及制备酯衍生物的方法。
• JP6169848
  申请人：——

  公开号：——

  公开（公告）日：——