Mercaptonorbornan | 71162-31-7

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 异戊烯醇脂质
• 英文名称: Mercaptonorbornan
• 英文别名: Bicyclo[2.2.1]heptane-2-thiol
• CAS: 71162-31-7
• 化学式: C₇H₁₂S
• 分子量: 128.238
• InChiKey: IOPZYMJYUACERA-UHFFFAOYSA-N

物化性质

• 沸点：
  180.7±9.0 °C(Predicted)
• 密度：
  1.04±0.1 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  2.3
• 重原子数：
  8
• 可旋转键数：
  0
• 环数：
  2.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  1
• 氢给体数：
  1
• 氢受体数：
  1

反应信息

• 作为反应物：
  描述：

  Mercaptonorbornan 、 三氯硫氯甲烷 在 sodium hydroxide 作用下， 生成 2-(trichloromethyldisulfanyl)bicyclo[2.2.1]heptane
  参考文献：
  名称：

  三氯甲磺酰氯与醇和硫醇的一些反应

  摘要：

  DOI：

  10.1021/je00042a046

文献信息

• [EN] DIARYL-5-OXYGENATED-2-(5H)-FURANONES AS COX-2 INHIBITORS<br/>[FR] DIARYL-5-OXYGENE-2-(5H)-FURANONES UTILES COMME INHIBITEURS DE COX-2
  申请人：MERCK FROSST CANADA INC.

  公开号：WO1996036623A1

  公开（公告）日：1996-11-21

  (EN) The invention encompasses the novel compound of Formula (I) as well as a method of treating cyclooxygenase-2 mediated diseases comprising administration to a patient in need of such treatment of a non-toxic therapeutically effective amount of a compound of Formula (I). The invention also encompasses certain pharmaceutical compositions for treatment of cyclooxygenase-2 mediated diseases comprising compounds of Formula (I).(FR) L'invention concerne le nouveau composé de formule (I) ainsi qu'un procédé de traitement de maladies induites par cyclooxygénase-2, consistant à administrer à un patient ayant besoin d'un tel traitement une quantité non toxique, thérapeutiquement efficace d'un composé de formule (I). L'invention concerne également certaines compositions pharmaceutiques permettant de traiter les maladies induites par cyclooxygénase-2, ces compositions comprenant des composés de la formule (I).

  该发明涵盖了化合物I的新颖化合物，以及治疗环氧合酶-2介导的疾病的方法，包括向需要此类治疗的患者施用化合物I的非毒性治疗有效量。该发明还涵盖了用于治疗环氧合酶-2介导的疾病的某些药物组合物，其中包括化合物I。
• Sulfonium salts, radiation- sensitive acid generators, and positive radiator-sensitive resin compositions
  申请人：Miyamatsu Takashi

  公开号：US20060141383A1

  公开（公告）日：2006-06-29

  A sulfonium salt compound excelling in transparency to deep ultraviolet rays at a wavelength of 220 nm or less, exhibiting well-balanced excellent performance such as sensitivity, resolution, pattern form, LER, and storage stability when used as a photoacid generator, a photoacid generator comprising the sulfonium salt compound, and a positive-tone radiation-sensitive resin composition containing the photoacid generator. The sulfonium salt compound is shown by the following formula (I), wherein R 1 represents a halogen atom, an alkyl group, a monovalent alicyclic hydrocarbon group, an alkoxyl group, or —OR 3 group, wherein R 3 is a monovalent alicyclic hydrocarbon group, R 2 represents a (substituted)-alkyl group or two or more R 2 groups form a cyclic structure, p is 0-7, q is 0-6, n is 0-3, and X − indicates a sulfonic acid anion. The positive-tone radiation-sensitive resin composition comprises (A) a photoacid generator of the sulfonium-salt compound and (B) an acid-dissociable group-containing resin.

  一种亚砜盐化合物，在波长为220纳米或更短的深紫外线下具有优异的透明度，当用作光酸发生剂时，表现出良好的性能平衡，如灵敏度、分辨率、图案形态、LER和储存稳定性。该光酸发生剂包含亚砜盐化合物，且包含该光酸发生剂的正电调辐射敏感树脂组成物。该亚砜盐化合物由以下公式(I)表示，其中R1表示卤素原子、烷基、一价脂环烃基、烷氧基或-OR3基，其中R3为一价脂环烃基，R2表示(取代)-烷基或两个或更多的R2基形成环状结构，p为0-7，q为0-6，n为0-3，X-表示磺酸根离子。该正电调辐射敏感树脂组成物包括(A)亚砜盐化合物的光酸发生剂和(B)含酸可解离基团的树脂。
• Onium salt compound and radiation-sensitive resin composition
  申请人：Yoneda Eiji

  公开号：US20050053861A1

  公开（公告）日：2005-03-10

  An onium salt compound having a cation moiety of the following formula (1) is disclosed. wherein A represents I or S, m is 1 or 2, n is 0 or 1, x is 1-10, and Ar1 and Ar2 are (substituted) aromatic hydrocarbon group, and P represents —O—SO 2 R, —O—S(O)R, or —SO 2 R, wherein R represents a hydrogen atom, a (substituted) alkyl group, or a (substituted) alicyclic hydrocarbon group. The onium salt compound is suitable as a photoacid generator for photoresists of a positive-tone radiation-sensitive resin composition. The positive-tone radiation-sensitive resin composition containing this compound is useful as a chemically-amplified photoresist exhibiting high resolution at high sensitivity, responsive to various radiations, and having outstanding storage stability.

  本发明揭示了一种具有以下式（1）的阳离子部分的醇盐化合物。其中，A代表I或S，m为1或2，n为0或1，x为1-10，Ar1和Ar2为（取代）芳香烃基，P代表-O-SO2R，-O-S（O）R或-SO2R，其中R代表氢原子，（取代）烷基或（取代）脂环烃基。该醇盐化合物适用于用于正向调节辐射敏感树脂组成物的光酸发生剂。含有该化合物的正向调节辐射敏感树脂组成物是一种化学放大的光刻胶，具有高灵敏度和高分辨率，对各种辐射具有响应性，并具有优异的储存稳定性。
• METHOD FOR PRODUCING ORGANIC COMPOUND AND ORGANIC COMPOUND OBTAINED BY THE METHOD
  申请人：Enomura Masakazu

  公开号：US20110178199A1

  公开（公告）日：2011-07-21

  Disclosed herein are a reaction method and a production method of an organic compound which are capable of achieving high reaction selectivity according to the purpose and a high production rate of a target substance. The methods include at least two fluids, wherein at least one kind of the fluids is a fluid containing at least one organic compound and at least one kind of the fluids other than the above fluid is a fluid containing at least one reactant in the form of a liquid or solution, and the respective fluids join together in a thin film fluid foamed between processing surfaces arranged to be opposite to each other so as to be able to approach to and separate from each other, at least one of which rotates relative to the other, whereby an organic reaction is performed in the thin film fluid.

  本文公开了一种有机化合物的反应方法和生产方法，能够根据目的实现高反应选择性和目标物质的高产率。该方法包括至少两种流体，其中至少一种流体是含有至少一种有机化合物的流体，除上述流体外的至少一种流体是以液态或溶液形式含有至少一种反应物的流体。这些各自的流体在处理表面之间形成一个薄膜流体泡沫，这些处理表面相对排列以便能够相互接近和分离，其中至少有一个表面相对于另一个表面旋转，从而在薄膜流体中进行有机反应。
• SULFONIUM SALTS, RADIATION-SENSITIVE ACID GENERATORS, AND POSITIVE RADIATION-SENSITIVE RESIN COMPOSITIONS
  申请人：JSR Corporation

  公开号：EP1586570A1

  公开（公告）日：2005-10-19

  A sulfonium salt compound excelling in transparency to deep ultraviolet rays at a wavelength of 220 nm or less, exhibiting well-balanced excellent performance such as sensitivity, resolution, pattern form, LER, and storage stability when used as a photoacid generator, a photoacid generator comprising the sulfonium salt compound, and a positive-tone radiation-sensitive resin composition containing the photoacid generator. The sulfonium salt compound is shown by the following formula (I), wherein R1 represents a halogen atom, an alkyl group, a monovalent alicyclic hydrocarbon group, an alkoxyl group, or -OR3 group, wherein R3 is a monovalent alicyclic hydrocarbon group, R2 represents a (substituted)-alkyl group or two or more R2 groups form a cyclic structure, p is 0-7, q is 0-6, n is 0-3, and X- indicates a sulfonic acid anion. The positive-tone radiation-sensitive resin composition comprises (A) a photoacid generator of the sulfonium-salt compound and (B) an acid-dissociable group-containing resin.

  一种锍盐化合物，对波长 220 纳米以下的深紫外线具有优异的透明性，用作光酸发生器时，在灵敏度、分辨率、图案形状、LER 和储存稳定性等方面表现出均衡的优异性能；一种包含该锍盐化合物的光酸发生器；以及一种包含该光酸发生器的正色调辐射敏感树脂组合物。 锍盐化合物如下式（I）所示、 其中 R1 代表卤素原子、烷基、一价脂环烃基、烷氧基或 -OR3 基团，其中 R3 是一价脂环烃基，R2 代表（取代的）烷基或两个或多个 R2 基团形成环状结构，p 是 0-7，q 是 0-6，n 是 0-3，X- 表示磺酸阴离子。 正色调辐射敏感树脂组合物包括 (A) 锍盐化合物的光酸发生器和 (B) 含酸可分解基团的树脂。