2-(1-Bicyclo<2.2.1>heptyl)ethanol | 129917-18-6

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 异戊烯醇脂质
• 英文名称: 2-(1-Bicyclo<2.2.1>heptyl)ethanol
• 英文别名: 2-(Bicyclo[2.2.1]heptan-1-yl)ethan-1-ol；2-(1-bicyclo[2.2.1]heptanyl)ethanol
• CAS: 129917-18-6
• 化学式: C₉H₁₆O
• 分子量: 140.225
• InChiKey: JCXURIRFVUOSAP-UHFFFAOYSA-N

物化性质

• 沸点：
  213.0±8.0 °C(Predicted)
• 密度：
  1.038±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  2.5
• 重原子数：
  10
• 可旋转键数：
  2
• 环数：
  2.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  20.2
• 氢给体数：
  1
• 氢受体数：
  1

反应信息

• 作为产物：
  描述：

  聚合甲醛 、 Lithium, (bicyclo[2.2.1]hept-1-ylmethyl)- 以 乙醚 、 正戊烷 为溶剂， 以68%的产率得到2-(1-Bicyclo<2.2.1>heptyl)ethanol
  参考文献：
  名称：

  Preparation of 1-substituted bicyclo[2.2.1]heptanes by anionic cyclization of a 5-hexen-1-yllithium

  摘要：

  DOI：

  10.1021/jo00311a028

文献信息

• [EN] PROTEIN TYROSINE PHOSPHATASE INHIBITORS AND METHODS OF USE THEREOF<br/>[FR] INHIBITEURS DE PROTÉINE TYROSINE PHOSPHATASE ET LEURS PROCÉDÉS D'UTILISATION
  申请人：CALICO LIFE SCIENCES LLC

  公开号：WO2020186199A1

  公开（公告）日：2020-09-17

  Provided herein are compounds, compositions, and methods useful for inhibiting protein tyrosine phosphatase, e.g., protein tyrosine phosphatase non-receptor type 2 (PTPN2) and/or protein tyrosine phosphatase non-receptor type 1 (PTPN1), and for treating related diseases, disorders and conditions favorably responsive to PTPN 1 or PTPN2 inhibitor treatment, e.g., a cancer or a metabolic disease.

  本文提供了用于抑制蛋白酪氨酸磷酸酶的化合物、组合物和方法，例如蛋白酪氨酸磷酸酶非受体型2（PTPN2）和/或蛋白酪氨酸磷酸酶非受体型1（PTPN1），以及用于治疗对PTPN1或PTPN2抑制剂治疗有良好反应的相关疾病、紊乱和状况的方法，例如癌症或代谢性疾病。
• Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist film
  申请人：FUJIFILM CORPORATION

  公开号：US10248019B2

  公开（公告）日：2019-04-02

  A pattern forming, method, includes: (i) forming a film from an actinic ray-sensitive or radiation-sensitive resin composition that contains (A) a compound capable of generating an acid upon irradiation with an actinic ray or radiation and decomposing by an action of an acid to decrease a solubility of the compound (A) for an organic solvent; (ii) exposing the film; and (iii) performing development by using a developer containing an organic solvent.

  一种形成图案的方法包括：(i) 使用一种含有（A）一种能够在受到光或辐射照射时生成酸并通过酸的作用分解以降低该化合物（A）对有机溶剂的溶解度的光敏或辐射敏感树脂组合物形成薄膜；(ii) 曝光薄膜；和(iii) 使用含有有机溶剂的显影剂进行显影。
• PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM
  申请人：Enomoto Yuichiro

  公开号：US20120282548A1

  公开（公告）日：2012-11-08

  Provided is a pattern forming method comprising (i) a step of forming a film from an actinic ray-sensitive or radiation-sensitive resin composition, (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using an organic solvent-containing developer, wherein the actinic ray-sensitive or radiation-sensitive resin composition comprises (A) a resin capable of decreasing the solubility for an organic solvent-containing developer by the action of an acid, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, (D) a solvent, and (G) a compound having at least either one of a fluorine atom and a silicon atom and having basicity or being capable of increasing the basicity by the action of an acid.

  提供的是一种形成图案的方法，包括(i)使用光致或辐射敏感树脂组成物形成薄膜的步骤，(ii)曝光薄膜的步骤，以及(iii)使用有机溶剂含有的显影剂显影曝光后的薄膜的步骤，其中光致或辐射敏感树脂组成物包括(A)一种能够通过酸的作用降低有机溶剂含有的显影剂的溶解度的树脂，(B)一种能够在光致或辐射照射下生成酸的化合物，(D)一种溶剂，以及(G)一种具有氟原子和硅原子中的至少一种，并具有碱性或能够通过酸的作用增加碱性的化合物。
• ACTIVE LIGHT RAY SENSITIVE OR RADIOACTIVE RAY SENSITIVE RESIN COMPOSITION, AND ACTIVE LIGHT RAY SENSITIVE OR RADIOACTIVE RAY SENSITIVE FILM AND PATTERN FORMING METHOD USING THE SAME
  申请人：KAWABATA Takeshi

  公开号：US20120082939A1

  公开（公告）日：2012-04-05

  An active light ray sensitive or radioactive ray sensitive resin composition which satisfies high sensitivity, high resolution, good pattern configuration, and good line edge roughness at the same time to a great extent, while having sufficiently good outgassing performance during exposure, and an active light ray sensitive or radioactive ray sensitive film formed by using the composition, and a pattern-forming method, are provided. The active light ray sensitive or radioactive ray sensitive resin composition according to the present invention includes a resin (P) containing a repeating unit (A) which decomposes by irradiation with active light ray or radioactive ray to generate an acid, and a repeating unit (C) containing a primary or secondary hydroxyl group.

  提供了一种活性光线敏感或放射线敏感的树脂组合物，其在很大程度上同时满足高灵敏度、高分辨率、良好的图案配置和良好的线边粗糙度，同时在曝光期间具有足够好的排气性能，以及使用该组合物形成的活性光线敏感或放射线敏感薄膜和形成图案的方法。本发明的活性光线敏感或放射线敏感的树脂组合物包括含有重复单元（A）的树脂（P），该重复单元通过活性光线或放射线辐射分解生成酸，并且含有主要或次要羟基的重复单元（C）。
• PROCESS FOR THE PREPARATION OF HIGH PURITY NORBORNENE ALKANOLS AND DERIVATIVES THEREOF
  申请人：PROMERUS, LLC

  公开号：US20160264498A1

  公开（公告）日：2016-09-15

  A process for the preparation of a variety of high purity norbornene alkanol monomers and their derivatives is disclosed and claimed. Specifically, a process for the preparation of industrial scale high purity norbornene methanol and its silyl ether derivative is disclosed and claimed. The high purity monomers prepared in accordance with the process of this invention are useful in a variety of applications including but not limited to the preparation of high quality and high purity polynorbornenes having utility in a variety of electronic applications, among various other applications.

  本发明揭示和声明了一种制备各种高纯度脱环戊二烯烷基醇单体及其衍生物的工艺。具体而言，本发明揭示和声明了一种制备工业规模高纯度脱环戊二烯甲醇及其硅醚衍生物的工艺。根据本发明工艺制备的高纯度单体可用于各种应用，包括但不限于制备在各种电子应用中有用的高质量和高纯度聚脱环戊二烯，以及其他各种应用。