RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ACID GENERATING AGENT AND COMPOUND
申请人:JSR CORPORATION
公开号:US20130078579A1
公开(公告)日:2013-03-28
A radiation-sensitive resin composition includes an acid generating agent to generate a compound represented by a following formula (1) by irradiation with a radioactive ray. In the formula (1), R
1
represents a monovalent organic group having 1 to 20 carbon atoms. R
2
represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms. The compound represented by the formula (1) is preferably a compound represented by a following formula (1-1). In the formula (1-1), R
2
is as defined in the above formula (1). X represents an electron attractive group. R
3
represents a monovalent organic group having 1 to 20 carbon atoms.