3-thiatricyclo[3,2,1.02,4 ]-octane | 278-76-2

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 异戊烯醇脂质
• 英文名称: 3-thiatricyclo[3,2,1.02,4 ]-octane
• 英文别名: 3-thiatricyclo[3.2.1.02,4 ]-octane；2,3-Epithio-norbornan；3-Thiatricyclo[3.2.1.02,4]octane
• CAS: 278-76-2
• 化学式: C₇H₁₀S
• 分子量: 126.222
• InChiKey: MRXJLFBJXNFAJM-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.9
• 重原子数：
  8
• 可旋转键数：
  0
• 环数：
  3.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  25.3
• 氢给体数：
  0
• 氢受体数：
  1

反应信息

• 作为反应物：
  描述：

  3-thiatricyclo[3,2,1.02,4 ]-octane 、 甲醇 、 二氯甲烷 、 氧气 以100%的产率得到
  参考文献：
  名称：

  AKASAKA, TAKESHI;KAKO, MASAHIRO;SONOBE, HIDEKI;ANDO, WATARU, J. AMER. CHEM. SOC., 110,(1988) N 2, 494-496

  摘要：

  DOI：
• 作为产物：
  描述：

  降冰片烯 在 3,3,7,8-tetramethyl-9,10-dioxa-11-thiatricyclo<6.2.1.0^1,6>undec-6-en-5-one 作用下， 以 氘代氯仿 为溶剂， 反应 2.0h， 以52%的产率得到3-thiatricyclo[3,2,1.02,4 ]-octane
  参考文献：
  名称：

  Synthesis of thiiranes through direct sulfur transfer to cycloalkenes in the thermolysis of a thiophene endoperoxide

  摘要：

  Thiophene endoperoxide 2, which was prepared by photo-oxygenation of thiophene 1, transfers a sulfur atom to form thiiranes when thermolysed in the presence of cycloalkenes, an unexpectedly efficient process which can be catalysed by the cobalt-tetraphenylporphine complex.

  DOI：

  10.1039/cc9960000177

文献信息

• Direct Thioepoxidation of Strained Cyclic Alkenes by the Photolytic Sulfur-Atom Transfer from Thiocarbonyl <i>S</i>-Oxides (Sulfines)
  作者：Waldemar Adam、Oliver Deeg、Stephan Weinkötz

  DOI：10.1021/jo971133e

  日期：1997.10.1
• 1,3-Dipolar Cycloaddition of Fluorenethione <i>S</i>-Oxide and <i>trans</i>-Cyclooctene:  Isolation of a Sultene and Its Novel Acid-Catalyzed Diastereoselective Sulfur-Atom Transfer to Cyclic Olefins
  作者：Waldemar Adam、Stephan Weinkötz

  DOI：10.1021/ja980338h

  日期：1998.5.1
• COMPOSITION AND POLYMER
  申请人：Asahi Kasei Kabushiki Kaisha

  公开号：EP2735581B1

  公开（公告）日：2021-07-14
• Composition and Polymer
  申请人：Nakamura Akitake

  公开号：US20140121293A1

  公开（公告）日：2014-05-01

  Disclosed is a composition comprising (A) at least one compound selected from the group consisting of an ether compound having two or more ether groups, a trivalent phosphorus compound, and a ketone compound, (B) a boron trihalide, and (C) an episulfide compound.
• ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM, MASK BLANK AND METHOD OF FORMING PATTERN
  申请人：FUJIFILM Corporation

  公开号：US20140242502A1

  公开（公告）日：2014-08-28

  According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes a compound (A) that contains a structure (P) containing at least one phenolic hydroxyl group and a structure (Q) containing at least one phenolic hydroxyl group whose hydrogen atom is replaced by a group (S) with a cyclic structure containing an acid crosslinking group, characterized in that the group (S) with a cyclic structure containing an acid crosslinking group is a group with a polycyclic structure or a group with a cyclic structure containing a hydroxymethyl group and/or an alkoxymethyl group.