2-methyl tricyclo[5.2.1.0^2,6]dodecan-2-yl methacrylate | 280123-21-9

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 异戊烯醇脂质
• 英文名称: 2-methyl tricyclo[5.2.1.0^2,6]dodecan-2-yl methacrylate
• 英文别名: (8-Methyl-8-tricyclo[5.2.1.02,6]decanyl) 2-methylprop-2-enoate
• CAS: 280123-21-9
• 化学式: C₁₅H₂₂O₂
• 分子量: 234.338
• InChiKey: DACXSUNAEKMOAL-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  4
• 重原子数：
  17
• 可旋转键数：
  3
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.8
• 拓扑面积：
  26.3
• 氢给体数：
  0
• 氢受体数：
  2

文献信息

• BASIC COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS
  申请人：Hatakeyama Jun

  公开号：US20120141938A1

  公开（公告）日：2012-06-07

  A chemically amplified resist composition comprising a base polymer, an acid generator, and an amine quencher in the form of a β-alanine, γ-aminobutyric acid or 5-aminovaleric acid derivative having an acid labile group-substituted carboxyl group has a high contrast of alkaline dissolution rate before and after exposure and forms a pattern of good profile at a high resolution, minimal roughness and wide focus margin.

  一种化学放大型光刻胶组合物，包括基础聚合物、酸发生剂和胺淬灭剂，后者为β-丙氨酸、γ-氨基丁酸或5-氨基戊酸的衍生物，具有一个被酸不稳定基团所取代的羧基，这种组合物在曝光前后具有高对比度的碱性溶解速率，并且能够形成高分辨率、最小粗糙度和宽焦深度的良好图案轮廓。
• MONOMER, POLYMER, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND PATTERNING PROCESS
  申请人：Hatakeyama Jun

  公开号：US20110294070A1

  公开（公告）日：2011-12-01

  A polymer is obtained from a hydroxyphenyl methacrylate monomer having an acid labile group substituted thereon. A positive resist composition comprising the polymer as a base resin has a very high contrast of alkaline dissolution rate before and after exposure, a high resolution, a good profile and minimal line edge roughness of a pattern after exposure, a retarded acid diffusion rate, and good etching resistance.

  一种聚合物是由一种具有酸敏感基团的羟基苯甲酸甲酯单体合成得到的。该聚合物作为基础树脂的正性光阻组合物具有极高的曝光前后碱溶解速率对比度、高分辨率、曝光后图案的良好轮廓和极小的线边粗糙度、缓慢的酸扩散速率和良好的蚀刻抗性。
• MONOMER, POLYMER, POSITIVE RESIST COMPOSITION, AND PATTERNING PROCESS
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US20170008982A1

  公开（公告）日：2017-01-12

  A polymer comprising recurring units derived from a polymerizable monomer having two structures of hydroxyphenyl methacrylate having a hydroxy group substituted with an acid labile group is used as base resin in a positive resist composition, especially chemically amplified positive resist composition. The resist composition forms a resist film which is processed by lithography into a pattern of good profile having a high resolution, minimal edge roughness, and etch resistance.

  一种聚合物，包含由可聚合单体衍生的重复单元，该单体具有两种羟基苯甲酸甲酯结构，羟基上取代有酸不稳定基团，作为正性光刻胶组成中的基础树脂，尤其是化学放大正性光刻胶组成中。该光刻胶组成形成一种光刻胶膜，通过光刻技术加工成具有高分辨率、最小边缘粗糙度和蚀刻抗性的良好轮廓图案。
• Polymerizable compound, polymer, positive resist composition, and patterning process using the same
  申请人：Hatakeyama Jun

  公开号：US20090297979A1

  公开（公告）日：2009-12-03

  The present invention provides; a polymer suitable as a base resin for a positive resist composition, in particular a chemically amplified positive resist composition, having a higher resolution, a larger exposure allowance, a smaller sparse-dense size difference, a better process applicability, a better pattern configuration after exposure, and in addition, a further excellent etching resistance, than a conventional positive resist; a positive resist composition using the same; a patterning process; and a novel polymerizable compound to obtain a polymer like this. The present invention was accomplished by a polymer whose hydrogen atom of at least a carboxyl group is substituted by an acid labile group represented by the following general formula (2), a positive resist composition using the same, a patterning process, and a novel polymerizable compound to obtain a polymer like this.

  本发明提供了一种聚合物，适用于作为正向光刻胶组成的基础树脂，特别是化学放大正向光刻胶组成，具有更高的分辨率、更大的曝光容差、更小的稀密差异、更好的工艺适用性、曝光后更好的图案构形，以及比传统正向光刻胶更出色的蚀刻抗性；使用该聚合物的正向光刻胶组成；一种图案化工艺；以及一种新型的可聚合化合物，以获得类似的聚合物。本发明通过一种聚合物实现，其至少一个羧基的氢原子被下述通式（2）所表示的酸敏感基团所取代，使用该聚合物的正向光刻胶组成，一种图案化工艺，以及一种新型的可聚合化合物，以获得类似的聚合物。
• RESIST COMPOSITION, PATTERNING PROCESS, MONOMER, AND COPOLYMER
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20130309606A1

  公开（公告）日：2013-11-21

  A polymer is obtained from copolymerization of a recurring unit having a carboxyl and/or phenolic hydroxyl group substituted with an acid labile group and a recurring unit having formula (1) wherein R 1 is methyl, ethyl, propyl, methoxy, ethoxy or propoxy, R 2 is H or CH 3 , and m is 1 to 4. The polymer is used as a base resin to formulate a resist composition, which is improved in contrast of alkali dissolution rate before and after exposure, acid diffusion control, resolution, and profile and edge roughness of a pattern after exposure.

  一种聚合物是通过共聚反应获得的，其中具有羧酸和/或酚羟基的重复单元被取代为酸易裂解基团，而具有公式（1）的重复单元的R1为甲基，乙基，丙基，甲氧基，乙氧基或丙氧基，R2为H或CH3，m为1到4。该聚合物用作基础树脂来制备抗蚀剂组合物，该组合物在曝光前后的碱溶解速率对比、酸扩散控制、分辨率以及曝光后图案的轮廓和边缘粗糙度方面得到改善。