AQUEOUS SOLUTION FOR RESIST PATTERN COATING AND PATTERN FORMING METHOD USING THE SAME
申请人:NISSAN CHEMICAL CORPORATION
公开号:US20190243251A1
公开(公告)日:2019-08-08
A novel aqueous solution for resist pattern coating including, as an A component, a cyclodextrin selected from the group consisting of α-cyclodextrin, β-cyclodextrin, and γ-cyclodextrin, or a derivative of the cyclodextrin, as a B component, a solvent containing water as a main component, and as a component C, an organic sulfonic acid of Formula (2):
(wherein R
4
is alkyl or fluorinated alkyl group, or an aromatic group having at least one substituent, and M
+
is a hydrogen ion, an ammonium ion, a pyridinium ion, or an imidiazolium ion), or a salt thereof, wherein the content of the A component is 0.1% by mass to 10% by mass relative to 100% by mass of the total aqueous solution, and wherein the content of the organic sulfonic acid or the salt thereof is 0.01% by mass to 50% by mass relative to 100% by mass of the component A.