ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM AND METHOD OF FORMING PATTERN
申请人:FUJIFILM Corporation
公开号:EP2721446B1
公开(公告)日:2017-11-22
US9235116B2
申请人:——
公开号:US9235116B2
公开(公告)日:2016-01-12
[EN] ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM AND METHOD OF FORMING PATTERN<br/>[FR] COMPOSITION DE RÉSINE SENSIBLE À DES RAYONNEMENTS ACTINIQUES OU À UN RAYONNEMENT, FILM SENSIBLE À DES RAYONS ACTINIQUES OU À UN RAYONNEMENT À BASE DE CETTE COMPOSITION ET PROCÉDÉ DE FORMATION D'UN MOTIF
申请人:FUJIFILM CORP
公开号:WO2012173282A1
公开(公告)日:2012-12-20
According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes a compound (P) containing at least one phenolic hydroxyl group and at least one group with a phenolic hydroxyl group whose hydrogen atom is replaced by any of groups of general formula (1) below.