The invention relates to a process for the manufacture of a cephalosporin derivative of the formula I: ##STR1## in which X is a sulphur or oxygen atom or a sulphinyl radical, R.sup.1 is any one of the C-3 substituents from antibacterially-active cephalosporins known in the art, R.sup.2 is a hydrogen atom or a 1-6C alkyl or 2-6C alkenyl radical, R.sup.3 is a hydrogen atom or one of a variety of radicals defined in the specification, and the pharmaceutically-acceptable acid- and base-addition salts thereof, characterized by reaction of a compound of the formula IX: ##STR2## in which R.sup.16 and R.sup.17 individually have one of the values given above for R.sup.2 and R.sup.3, or a derivative thereof in which the carbonyl group is masked, with a compound of the formula X: ##STR3## in which R.sup.18 is a hydrogen atom or any one of the cephalosporin 3-carboxylic acid protecting groups known in the art; whereafter, when R.sup.18 is other than a hydrogen atom, the protecting group R.sup.18 is replaced by hydrogen by conventional means.
本发明涉及一种制备式I的
头孢菌素衍
生物的方法:##STR1## 其中X是
硫或氧原子或磺酰基,R1是艺术上已知的具有抗菌活性的
头孢菌素的C-3取代基之一,R2是氢原子或1-6C烷基或2-6C烯基基团,R3是氢原子或在规范中定义的各种基团之一,以及其药物可接受的酸和碱加合盐,其特征在于将式IX的化合物:##STR2## 其中R16和R17分别具有R2和R3的上述值之一,或其衍
生物,其中羰基基团被掩蔽,与式X的化合物反应:##STR3## 其中R18是氢原子或艺术上已知的
头孢菌素3-
羧酸保护基之一;随后,当R18不是氢原子时,通过常规手段将保护基R18替换为氢原子。