Highly Enantioselective Conjugate Addition of AlMe3 to Linear Aliphatic Enones by a Designed Catalyst
作者:Paul K. Fraser、Simon Woodward
DOI:10.1002/chem.200390087
日期:2003.2.3
of AlMe(3) to linear aliphatic enones in THF at -40 to -48 degrees C in the presence of [Cu(MeCN)(4)]BF(4). At ligand loadings of 5-20 mol %, enantioselectivities of 80-93 % are realised for most substrates. To attain these values, the use of highly pure AlMe(3) is mandatory. The presence of methylalumoxane (MAO), derived by hydrolysis, leads to reduced enantioselectivity and a conjugate addition product
Photochemistry of acetone in the presence of exocyclic olefins: an unexpected competition between the photo-Conia and Paternò–Büchi reactions
作者:Wen-Sheng Chung、Chia-Chin Ho
DOI:10.1039/a607415d
日期:——
When irradiated in the presence of several exocyclic olefins, acetone
undergoes homoalkylation with the olefins to form a series of
4-cycloalkylbutan-2-ones (with quantum yields of 0.14 ± 0.01)
rather than exhibiting the expected PaternòâBüchi
reaction; in contrast, the photolysis of perdeuteriated acetone gave both
types of products.
Novel copolymer, photoresist compositions thereof and deep UV bilayer system thereof
申请人:ARCH SPECIALTY CHEMICALS, INC.
公开号:US20040137362A1
公开(公告)日:2004-07-15
Novel copolymers suitable for forming the top layer photoimagable coating in a deep UV, particularly a 193 nm and 248 nm, bilayer resist system providing high resolution photolithography. Chemically amplified photoresist composition and organosilicon moieties suitable for use in the binder resin for photoimagable etching resistant photoresist composition that is suitable as a material for use in ArF and KrF photolithography using the novel copolymers.
Oxygen-induced reactions of organoboranes with the inert .alpha.,.beta.-unsaturated carbonyl derivatives. Convenient new aldehyde and ketone synthesis via hydroboration