(6-Cyano-5-oxo-4-oxatricyclo[4.2.1.03,7]nonan-2-yl) 4-(2-methylprop-2-enoyloxy)butanoate | 1189185-36-1

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 异戊烯醇脂质
• 英文名称: (6-Cyano-5-oxo-4-oxatricyclo[4.2.1.03,7]nonan-2-yl) 4-(2-methylprop-2-enoyloxy)butanoate
• CAS: 1189185-36-1
• 化学式: C₁₇H₁₉NO₆
• 分子量: 333.341
• InChiKey: ZJFAHLUGIYNVPA-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.6
• 重原子数：
  24
• 可旋转键数：
  8
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.65
• 拓扑面积：
  103
• 氢给体数：
  0
• 氢受体数：
  7

反应信息

• 作为产物：
  描述：

  甲基丙烯酸 、 (6-Cyano-5-oxo-4-oxatricyclo[4.2.1.03,7]nonan-2-yl) 4-chlorobutanoate 在 potassium carbonate 、 potassium iodide 作用下， 以 N-甲基吡咯烷酮 为溶剂， 反应 8.0h， 生成 (6-Cyano-5-oxo-4-oxatricyclo[4.2.1.03,7]nonan-2-yl) 4-(2-methylprop-2-enoyloxy)butanoate
  参考文献：
  名称：

  Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method using the same, polymerizable compound and polymer compound obtained by polymerizing the polymerizable compound

  摘要：

  公开号：

  EP2105440B1

文献信息

• CHEMICALLY AMPLIFIED PHOTORESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
  申请人：Ichikawa Koji

  公开号：US20100330497A1

  公开（公告）日：2010-12-30

  The present invention provides a resist composition giving a resist pattern excellent in CD uniformity and focus margin. A chemically amplified photoresist composition comprises a resin (A) and an acid generator (B), and the resin (A) contains, as a part or an entirety thereof, a copolymer (A1) which is obtained by polymerizing at least: a (meth) acrylic monomer (a1) having C 5-20 alicyclic hydrocarbon group which becomes soluble in an aqueous alkali solution by the action of an acid; a (meth) acrylic monomer (a2) having a hydroxy group-containing adamantyl group; and a (meth) acrylic monomer (a3) having a lactone ring, and the copolymer (A1) has a weight-average molecular weight of 2500 or more and 5000 or less, and a content of the copolymer (A1) is not less than 50 parts by mass with respect to 100 parts by mass of the resin (A).

  本发明提供了一种抗蚀剂组合物，可提供具有CD均匀性和对焦余地的抗蚀剂图案。一种化学放大光阻组合物包括树脂（A）和酸发生剂（B），其中树脂（A）至少包含以下共聚物（A1）的一部分或全部：通过聚合至少得到的（甲基）丙烯酸酯单体（a1），其具有C5-20萜环烃基团，通过酸的作用在水性碱溶液中变得溶解；具有含羟基的金刚烷基团的（甲基）丙烯酸酯单体（a2）；以及具有内酯环的（甲基）丙烯酸酯单体（a3），且共聚物（A1）的重均分子量为2500或更高但不超过5000，且共聚物（A1）的含量相对于树脂（A）的100质量份不少于50质量份。
• ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD USING THE SAME, POLYMERIZABLE COMPOUND AND POLYMER COMPOUND OBTAINED BY POLYMERIZING THE POLYMERIZABLE COMPOUND
  申请人：YAMAGUCHI Shuhei

  公开号：US20090246695A1

  公开（公告）日：2009-10-01

  An actinic ray-sensitive or radiation-sensitive resin composition and a pattern forming method using the composition are provided, the composition including (A) a resin containing a repeating unit having a group represented by formula (1) as defined in the specification, the resin being capable of increasing a solubility of the resin in an alkali developer by an action of an acid, and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; and a polymerizable compound represented by formula (M-1) as defined in the specification and a polymer compound obtained by polymerizing the polymerizable compound are provided.
• US8883394B2
  申请人：——

  公开号：US8883394B2

  公开（公告）日：2014-11-11
• US8916330B2
  申请人：——

  公开号：US8916330B2

  公开（公告）日：2014-12-23
• Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method using the same, polymerizable compound and polymer compound obtained by polymerizing the polymerizable compound
  申请人：FUJIFILM Corporation

  公开号：EP2105440B1

  公开（公告）日：2012-10-24