申请人:Fukumoto Takashi
公开号:US20090029290A1
公开(公告)日:2009-01-29
(1) A polymer compound for photoresist composition which is high in dissolution rate in a developing solution after exposure and small swelling at the development and (2) a compound which is a raw material for such a polymer compound are provided. Furthermore, (3) a photoresist composition containing the subject polymer compound is provided. In detail, a tertiary alcohol derivative represented by the following general formula (1) is provided.
(In the formula, R
1
and R
2
are taken together to form a ring together with a carbon atom to which R
1
and R
2
are bonded, and R
1
and R
2
as taken represent a linear, branched or cyclic alkylene group having from 2 to 9 carbon atoms, which may contain an oxygen atom at an arbitrary position; R
3
represents a hydrogen atom or a methyl group; w represents a linear, branched or cyclic alkylene group having from 1 to 10 carbon atoms; and n represents 0 or 1.)
(1) 提供了一种用于光刻胶组合物的聚合物化合物,该聚合物化合物在曝光后的显影溶液中具有高溶解速率,并且在显影过程中膨胀小。(2) 提供了一种用于制备此类聚合物化合物的原料化合物。(3) 还提供了一种包含该聚合物化合物的光刻胶组合物。具体而言,提供了以下通式(1)表示的三级醇衍生物。(在公式中,R1和R2与碳原子一起形成环,并且R1和R2表示具有2至9个碳原子的线性、支链或环烷基,可以在任意位置含有氧原子;R3表示氢原子或甲基基团;w表示具有1至10个碳原子的线性、支链或环烷基;n表示0或1。)