(Meth)acrylate compound, photosensitive polymer, and resist composition including the same
申请人:Choi Sang-Jun
公开号:US20100167200A1
公开(公告)日:2010-07-01
A (meth)acrylate compound having an acid-labile ester group, a photosensitive polymer, and a resist composition including the same, the (meth)acrylate compound being represented by the following Chemical Formula 1
wherein, R
1
is hydrogen or methyl, R
2
and R
3
are each independently a substituted or unsubstituted linear alkyl, a substituted or unsubstituted cyclic alkyl, or linked each other to form a monocyclic ring or a fused-ring, and R
4
is a linear ester or cyclic ester group.