COMPOUND, RESIN, AND METHOD FOR PURIFYING SAME, UNDERLAYER FILM FORMATION MATERIAL FOR LITHOGRAPHY, UNDERLAYER FILM FORMING COMPOSITION, AND UNDERLAYER FILM, AND METHOD FOR FORMING RESIST PATTERN AND METHOD FOR FORMING CIRCUIT PATTERN
申请人:Mitsubishi Gas Chemical Company, Inc.
公开号:EP3279179A1
公开(公告)日:2018-02-07
The present invention provides a compound represented by following formula (1),
wherein R1 represents a 2n-valent group having 1 to 30 carbon atoms, each of R2 to R5 independently represents a straight, branched or cyclic alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, an alkoxy group having 1 to 30 carbon atoms, a halogen atom, a thiol group or a hydroxyl group, provided that at least one selected from R1 to R5 represents a group including an iodine atom and at least one R4 and/or at least one R5 represent/represents one or more selected from the group consisting of a hydroxyl group and a thiol group, each of m2 and m3 independently represents an integer of 0 to 8, each of m4 and m5 independently represents an integer of 0 to 9, provided that m4 and m5 do not represent 0 at the same time, n represents an integer of 1 to 4, and each of p2 to p5 independently represents an integer of 0 to 2.
本发明提供了由下式(1)代表的化合物、
其中 R1 代表具有 1 至 30 个碳原子的 2n 价基团,R2 至 R5 各自独立地代表具有 1 至 10 个碳原子的直链、支链或环状烷基、具有 6 至 10 个碳原子的芳基、具有 2 至 10 个碳原子的烯基、具有 1 至 30 个碳原子的烷氧基、卤素原子、硫醇基或羟基、m2和m3各自独立地代表0至8的整数,m4和m5各自独立地代表0至9的整数,但m4和m5不能同时代表0,n代表1至4的整数,p2至p5各自独立地代表0至2的整数。