Fluorinated polymers, photoresists and associated processes for microlithography are described. These polymers and photoresists are comprised of esters derived from fluoroalcohol functional groups that simultaneously impart high ultraviolet (UV) transparency and developability in basic media to these materials. The materials of this invention have high UV transparency, particularly at short wavelengths, e.g., 157 nm, which makes them highly useful for lithography at these short wavelengths.
本文介绍了用于微光刻技术的含
氟聚合物、光刻胶和相关工艺。这些聚合物和光刻胶由源自
氟醇官能团的
酯类组成,同时赋予这些材料高紫外线(UV)透明度和在基本介质中的显影性。本发明的材料具有很高的紫外线透明度,特别是在短波长(如 157 纳米)下,这使得它们在这些短波长下的光刻技术中非常有用。