3,3-diiodo-2,2,4,4-tetramethylpentane | 84679-80-1

• 分子结构分类: 有机化合物 - 有机卤素化合物 - 有机碘化物
• 英文名称: 3,3-diiodo-2,2,4,4-tetramethylpentane
• 英文别名: 3,3-Diiodo-2,2,4,4-tetramethylpentan
• CAS: 84679-80-1
• 化学式: C₉H₁₈I₂
• 分子量: 380.051
• InChiKey: QMBORAGLOWORRQ-UHFFFAOYSA-N

物化性质

• 沸点：
  266.0±8.0 °C(Predicted)
• 密度：
  1.768±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  5.3
• 重原子数：
  11
• 可旋转键数：
  2
• 环数：
  0.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  0
• 氢给体数：
  0
• 氢受体数：
  0

反应信息

• 作为产物：
  描述：

  3-diazo-2,2,4,4-tetramethylpentane 在 碘 作用下， 以 四氯化碳 为溶剂， 生成 3,3-diiodo-2,2,4,4-tetramethylpentane
  参考文献：
  名称：

  DNMR investigations on 3,3-Dihalo-2,2,4,4-tetramethylpentanes

  摘要：

  AbstractThe 1H and 13C NMR spectra of 3,3,‐diiodotetramethylpentane (2), 3,3‐dibromotetramethylpentane (3), and 3,3‐dichlorotetramethylpentane (4) are temperature dependent. The activation parameters for the tert‐butyl group rotation in 2–4 have been determined. The 13C NMR chemical shifts are discussed.

  DOI：

  10.1002/omr.1270210117

文献信息

• METHOD FOR PRODUCING POLYMER, POLYMER, COMPOSITION FOR FORMING INSULATING FILM, METHOD FOR PRODUCING INSULATING FILM, AND INSULATING FILM
  申请人：JSR Corporation

  公开号：EP1705206A1

  公开（公告）日：2006-09-27

  There are provided a method for producing a polymer, a polymer, an insulating-film-forming composition, a method for producing an insulating film, and an insulating film capable of forming a film which is suitably used as an interlayer dielectric for semiconductor devices or the like and exhibits a low relative dielectric constant, excellent mechanical strength and adhesion, and uniform quality. A method for producing a polymer of the invention comprises hydrolyzing and condensing (B) a hydrolyzable-group-containing silane monomer in the presence of (A) a polycarbosilane, the polycarbosilane (A) being a polymer (I) obtained by reacting (a) a compound shown by the following general formula (1) and (b) at least one compound selected from the group consisting of a compound shown by the following general formula (2) and a compound shown by the following general formula (3) in an organic solvent in the presence of at least one of an alkali metal and an alkaline earth metal,         R1kCX4-k     (1)         R2kSiY4-k     (2)         R3mY3-mSiCR4nX3-n     (3) wherein R1 to R4 individually represent a monovalent organic group or a hydrogen atom, X represents a halogen atom, Y represents a halogen atom or an alkoxy group, k represents an integer from 0 to 3, and m and n individually represent integers from 0 to 2.

  本发明提供了一种聚合物的生产方法、一种聚合物、一种绝缘成膜组合物、一种绝缘膜的生产方法，以及一种能够形成薄膜的绝缘膜，该薄膜适合用作半导体器件或类似器件的层间电介质，并具有较低的相对介电常数、优异的机械强度和附着力以及均匀的质量。 生产本发明聚合物的方法包括在（A）聚碳酸酯硅烷存在下水解和缩合（B）含可水解基团的硅烷单体、聚碳硅烷(A)为聚合物(I)，由(a)下式(1)所示化合物和(b)至少一种选自下式(2)所示化合物和下式(3)所示化合物组成的组的化合物在有机溶剂中，在碱金属和碱土金属中至少一种存在下反应而得、 R1kCX4-k (1) R2kSiY4-k (2) R3mY3-mSiCR4nX3-n (3) 其中 R1 至 R4 分别代表一价有机基团或氢原子，X 代表卤素原子，Y 代表卤素原子或烷氧基，k 代表 0 至 3 的整数，m 和 n 分别代表 0 至 2 的整数。
• DNMR investigations on 3,3-Dihalo-2,2,4,4-tetramethylpentanes
  作者：Hans-Otto Kalinowski、Erwin Röcker、Günther Maier

  DOI：10.1002/omr.1270210117

  日期：1983.1

  AbstractThe 1H and 13C NMR spectra of 3,3,‐diiodotetramethylpentane (2), 3,3‐dibromotetramethylpentane (3), and 3,3‐dichlorotetramethylpentane (4) are temperature dependent. The activation parameters for the tert‐butyl group rotation in 2–4 have been determined. The 13C NMR chemical shifts are discussed.
• KREBS, A.;BORN, W.;KALETTA, B.;NICKEL, W. -U.;RUEGER, W., TETRAHEDRON LETT., 1983, 24, N 44, 4821-4824
  作者：KREBS, A.、BORN, W.、KALETTA, B.、NICKEL, W. -U.、RUEGER, W.

  DOI：——

  日期：——
• Method for producing polymer, polymer, composition for forming insulating film, method for producing insulating film, and insulating film
  申请人：Nakagawa Hisashi

  公开号：US20070015892A1

  公开（公告）日：2007-01-18

  A method for producing a polymer includes hydrolyzing and condensing (B) a hydrolyzable-group-containing silane monomer in the presence of (A) a polycarbosilane, the polycarbosilane (A) being a polymer (I) obtained by reacting (a) a compound shown by the following general formula (1) and (b) at least one compound selected from the group consisting of a compound shown by the following general formula (2) and a compound shown by the following general formula (3) in an organic solvent in the presence of at least one of an alkali metal and an alkaline earth metal, R 1 k CX 4-k (1) R 2 k SiY 4-k (2) R 3 m Y 3-m SiCR 4 n X 3-n (3) wherein R 1 to R 4 individually represent a monovalent organic group or a hydrogen atom, X represents a halogen atom, Y represents a halogen atom or an alkoxy group, k represents an integer from 0 to 3, and m and n individually represent integers from 0 to 2.
• Sterisch gehinderte alkene - VI. Auf dem weg zum tetra-tert.butylethen
  作者：Adolf Krebs、Wolfgang Born、Bernd Kaletta、Wolf-Ulrich Nickel、Wolfgang Rüger

  DOI：10.1016/s0040-4039(00)94016-4

  日期：1983.1