Bicyclo[2.2.1]heptane-2,3-dicarboxylic acid, 5-hydroxy- | 98954-78-0

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 异戊烯醇脂质
• 英文名称: Bicyclo[2.2.1]heptane-2,3-dicarboxylic acid, 5-hydroxy-
• 英文别名: 5-hydroxybicyclo[2.2.1]heptane-2,3-dicarboxylic acid
• CAS: 98954-78-0
• 化学式: C₉H₁₂O₅
• 分子量: 200.191
• InChiKey: OAWFFCOYTQSIRL-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  -0.6
• 重原子数：
  14
• 可旋转键数：
  2
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.78
• 拓扑面积：
  94.8
• 氢给体数：
  3
• 氢受体数：
  5

反应信息

• 作为反应物：
  描述：

  Bicyclo[2.2.1]heptane-2,3-dicarboxylic acid, 5-hydroxy- 在 4-二甲氨基吡啶 、 三乙胺 、 N,N'-二环己基碳二亚胺 作用下， 以 甲苯 为溶剂， 反应 25.0h， 生成 Ditert-butyl 5-(2-methylprop-2-enoyloxy)bicyclo[2.2.1]heptane-2,3-dicarboxylate
  参考文献：
  名称：

  RADIATION SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING A PATTERN, POLYMER AND COMPOUND

  摘要：

  一种辐射敏感性树脂组合物，包括具有下式（1）所代表的基团的第一聚合物和辐射敏感性酸发生剂。n是2到4的整数。X代表单键或二价有机基团。A代表（n+1）价的连接基团。每个Q独立地代表包括可溶于碱的基团的基团。

  公开号：

  US20120276482A1
• 作为产物：
  描述：

  纳迪克酸酐 在 甲酸 、 碳酸氢钠 、 sodium hydroxide 作用下， 以 水 、 四氢呋喃 为溶剂， 反应 112.0h， 以48%的产率得到Bicyclo[2.2.1]heptane-2,3-dicarboxylic acid, 5-hydroxy-
  参考文献：
  名称：

  RADIATION SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING A PATTERN, POLYMER AND COMPOUND

  摘要：

  一种辐射敏感性树脂组合物，包括具有下式（1）所代表的基团的第一聚合物和辐射敏感性酸发生剂。n是2到4的整数。X代表单键或二价有机基团。A代表（n+1）价的连接基团。每个Q独立地代表包括可溶于碱的基团的基团。

  公开号：

  US20120276482A1

文献信息

• Imide derivatives, and their production and use
  申请人：SUMITOMO PHARMACEUTICALS COMPANY, LIMITED

  公开号：EP0261688A1

  公开（公告）日：1988-03-30

  An imide derivative of the formula: or its salt, useful as an antipsychotic drug.

  或其盐的亚胺衍生物，可用作抗精神病药物。
• Imide derivatives, their production and use
  申请人：SUMITOMO PHARMACEUTICALS COMPANY, LIMITED

  公开号：EP0314098A2

  公开（公告）日：1989-05-03

  A compound of the formula: or its acid addition salt, which is useful as a psychotic drug.

  一种式子为 或其酸加成盐，可用作精神病药物。
• LOW AFFINITY SCREENING METHOD
  申请人：Graffinity Pharmaceuticals Aktiengesellschaft

  公开号：EP1360489A1

  公开（公告）日：2003-11-12
• Low affinity screening method
  申请人：——

  公开号：US20040082079A1

  公开（公告）日：2004-04-29

  A parallel high throughput screening method on a solid support is disclosed that allows the detection of low affinity binding partners, comprising the steps of:(a) providing a library of different ligands;(b) forming a binding matrix comprising the ligands on a solid support by immobilising said ligands on the support; (c) contacting a target of interest with said binding matrix; (d) parallely determining a binding value of the ligand/target interaction for each type of ligand comprised in the binding matrix; (e) selecting those ligands the binding value of which in an immobilised state towards the target exceeds a predetermined threshold; (f) evaluating the affinity of each of the ligands selected in step (e) in a non-immobilised state towards the target; (g) identifying at least one ligand of step (f) as low affinity binding ligand.
• SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION HAVING ORGANIC GROUP HAVING ALIPHATIC POLYCYCLIC STRUCTURE
  申请人：NISSAN CHEMICAL INDUSTRIES, LTD.

  公开号：US20170153549A1

  公开（公告）日：2017-06-01

  A resist underlayer film-forming composition for lithography having an aliphatic polycyclic structure including, as a silane, a hydrolyzable silane, a hydrolysis product thereof, a hydrolysis-condensation product thereof, or a combination thereof, in which the aliphatic polycyclic structure is a structure which a hydrolyzable silane of Formula (1): R 1 a R 2 b Si(R 3 ) 4−(a+b) Formula (1) (where R 1 is an organic group having an aliphatic polycyclic structure and bonded to a Si atom through a Si—C bond; R 3 is an ethoxy group; a is an integer of 1; b is an integer of 0 to 2; and a+b is an integer of 1 to 3) has, or a structure included in a compound added as an aliphatic polycyclic compound, an aliphatic polycyclic dicarboxylic acid, or an aliphatic polycyclic dicarboxylic acid anhydride, each optionally having a double bond, a hydroxy group, or an epoxy group.