Production Processes and Systems, Compositions, Surfactants, Monomer Units, Metal Complexes, Phosphate Esters, Glycols, Aqueous Film Foams, and Foam Stabilizers
申请人:Boggs Janet
公开号:US20070282115A1
公开(公告)日:2007-12-06
Production processes and systems are provided that include reacting halogenated compounds, dehalogenating compounds, reacting alcohols, reacting olefins and a saturated compounds, reacting reactants having at least two —CF
3
groups with reactants having cyclic groups. R
F
-compositions such as R
F
-intermediates, R
F
-surfactants, R
F
-monomers, R
F
-monomer units, R
F
-metal complexes, R
F
-phosphate esters, R
F
-glycols, R
F
-urethanes, and/or R
F
-foam stabilizers. The R
F
portion can include at least two —CF
3
groups, at least three —CF
3
groups, and/or at least two —CF
3
groups and at least two —CH
2
— groups. Detergents, emulsifiers, paints, adhesives, inks, wetting agents, foamers, and defoamers including the R
F
-surfactant composition are provided. Acrylics, resins, and polymers are provided that include a R
F
-monomer unit. Compositions are provided that include a substrate having a R
F
-composition thereover. Aqueous Film Forming Foam (“AFFF”) formulations are provided that can include R
F
-surfactants and/or R
F
-foam stabilizers are provided.
提供了包括反应卤代化合物、脱卤化合物、反应醇、反应烯烃和饱和化合物、反应至少具有两个-CF3基团的反应物与具有环状基团的反应物的生产过程和系统。提供了RF组分,例如RF中间体、RF表面活性剂、RF单体、RF单体单元、RF金属配合物、RF磷酸酯、RF乙二醇、RF聚氨酯和/或RF泡沫稳定剂。RF部分可以包括至少两个-CF3基团、至少三个-CF3基团,以及至少两个-CF3基团和至少两个-CH2-基团。提供了包括RF表面活性剂组分的洗涤剂、乳化剂、油漆、粘合剂、油墨、润湿剂、起泡剂和消泡剂。提供了包括RF单体单元的丙烯酸、树脂和聚合物。提供了包括RF组分覆盖在基底上的组合物。提供了可以包括RF表面活性剂和/或RF泡沫稳定剂的水性成膜泡沫(“AFFF”)配方。