COMPOUND, SALT, AND RADIATION-SENSITIVE RESIN COMPOSITION
申请人:Ebata Takuma
公开号:US20100221659A1
公开(公告)日:2010-09-02
A compound has a partial structure shown by a following formula (1),
wherein R
1
represents a hydrogen atom or a substituted or unsubstituted hydrocarbon group having 1 to 8 carbon atoms, R
2
represents a substituted or unsubstituted hydrocarbon group having 1 to 8 carbon atoms, Rf represents a fluorine atom or a perfluoroalkyl group having 1 to 4 carbon atoms, L represents an integer from 0 to 4, n represents an integer from 0 to 10, and m represents an integer from 1 to 4.