3-ethoxy-tetrahydrofuran-2-one | 25600-26-4

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 内酯类
• 英文名称: 3-ethoxy-tetrahydrofuran-2-one
• 英文别名: α-Aethoxy-γ-butyrolacton；α-Aethoxy-butanolid-1,4；3-ethoxy-dihydro-furan-2-one；3-Ethoxyoxolan-2-one
• CAS: 25600-26-4
• 化学式: C₆H₁₀O₃
• 分子量: 130.144
• InChiKey: RLIBDDCOECOTSO-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  0.5
• 重原子数：
  9
• 可旋转键数：
  2
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.83
• 拓扑面积：
  35.5
• 氢给体数：
  0
• 氢受体数：
  3

反应信息

• 作为反应物：
  描述：

  3-ethoxy-tetrahydrofuran-2-one 在 bis(1,5-cyclooctadiene)nickel (0) 、 [1,3-bis-(2,4,6-trimethylphenyl)-2-imidazolidinylidene]dichloro(benzylidene)(triphenylphosphine) ruthenium(II) potassium tert-butylate 、 sodium hexamethyldisilazane 、 二异丁基氢化铝 、 R-(+)-1,1'-联萘-2,2'-双二苯膦 、 三乙胺 、 zinc dibromide 作用下， 以 四氢呋喃 、 甲醇 、 二氯甲烷 、 甲苯 为溶剂， 反应 106.83h， 生成 benzyl (4S)-4-ethoxy-4-phenyl-3,7-dihydro-2H-azepine-1-carboxylate
  参考文献：
  名称：

  Synthesis of 4,4′-Disubstituted Azepines via Ring-Closing Metathesis Reaction and Asymmetric Arylation of Lactones

  摘要：

  标题化合物的合成通过一系列独特的反应实现，包括使用第二代Grubbs催化剂对ω-二烯进行闭环复分解反应。手性二烯前体可以从相应的α,α′-二取代内酯衍生物中获得，具有外消旋或光学富集形式。

  DOI：

  10.1055/s-2006-926433
• 作为产物：
  描述：

  3-diazodihydrofuran-2(3H)-one 、 乙醇 以37%的产率得到
  参考文献：
  名称：

  SCHMITZ, A.; KRAATZ, U.; KORTE, F., CHEM. BER. , 1975, 108, NO 4, 1010-1016

  摘要：

  DOI：

文献信息

• [EN] RETROMETABOLIC COMPOUNDS<br/>[FR] COMPOSÉS RÉTROMÉTABOLIQUES
  申请人：CYTOPIA RES PTY LTD

  公开号：WO2009029998A1

  公开（公告）日：2009-03-12

  The present invention relates to phenylaminopyrimidine compounds that are retrometabolic drugs or metabolites thereof. These compounds are also inhibitors of protein kinases including JAK kinases, in particular JAK2 kinases and can be used in the treatment of kinase associated diseases such as vascular diseases including pulmonary arterial hypertension (PAH), hypertension, hypertrophy and ischemia; immunological or inflammatory diseases including asthma and Chronic Obstructive Pulmonary Disease (COPD); and hyperproliferative diseases such as cancer including lung cancer.

  本发明涉及苯基氨基嘧啶化合物，它们是逆代谢药物或其代谢物。这些化合物也是蛋白激酶的抑制剂，包括JAK激酶，特别是JAK2激酶，并可用于治疗与激酶相关的疾病，如包括肺动脉高压（PAH）、高血压、肥大和缺血在内的血管疾病；免疫或炎症性疾病，如哮喘和慢性阻塞性肺病（COPD）；以及包括肺癌在内的增殖过度性疾病。
• POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD
  申请人：Kinoshita Yohei

  公开号：US20090035698A1

  公开（公告）日：2009-02-05

  The present invention is a positive resist composition and a resist pattern forming method including a resin component (A) which has a polymer compound (A1) having a structural units (a1) including an acetal type acid dissociable, dissolution inhibiting group, a structural unit (a2) derived from an acrylate ester having a lactone-containing polycyclic group, and a structural unit (a3) derived from an acrylate ester having a polar group-containing aliphatic hydrocarbon group, and an acid generator component (B) having an onium salt-based acid generator (B1) having a cation portion represented by a general formula (b-1) shown below [wherein, R 11 represents an alkyl group, an alkoxy group, a halogen atom or a hydroxyl group; R 12 to R 13 each represents, independently, an aryl group or the alkyl group that may have substituent group; n′ represents either 0 or an integer from 1 to 3].

  本发明涉及一种正性光阻组合物和一种光阻图案形成方法，包括树脂组分（A）和酸发生剂组分（B）。其中，树脂组分（A）包括聚合物化合物（A1），其具有包括缩醛型酸解离、溶解抑制基的结构单元（a1），源自含有内酯基多环芳香族基团的丙烯酸酯的结构单元（a2），以及源自含有极性基团的脂肪族烃基的丙烯酸酯的结构单元（a3）；酸发生剂组分（B）包括一个离子型盐基酸发生剂（B1），其阳离子部分由下式（b-1）表示[其中，R11代表烷基、烷氧基、卤素原子或羟基；R12到R13各自独立地代表芳基或可能具有取代基的烷基；n'代表0或1到3的整数]。
• Compound for Resist and Radiation-Sensitive Composition
  申请人：Echigo Masatoshi

  公开号：US20080113294A1

  公开（公告）日：2008-05-15

  A radiation-sensitive composition containing 1 to 80% by weight of a solid component and 20 to 99% by weight of a solvent. The solid component contains a compound B which has (a) a structure derived from a polyphenol compound A by introducing an acid-dissociating group to at least one phenolic hydroxyl group of the polyphenol compound A which is synthesized by a condensation between a di- to tetrafunctional aromatic ketone or aromatic aldehyde each having 5 to 36 carbon atoms with a compound having 1 to 3 phenolic hydroxyl groups and 6 to 15 carbon atoms, and (b) a molecular weight of 400 to 2000. The composition containing the compound B is useful as an acid-amplified, non-polymeric resist material, because it is highly sensitive to radiation such as KrF excimer lasers, extreme ultraviolet rays, electron beams, and X-rays, and provides resist patterns with a high resolution, high heat resistance, and high etching resistance.

  一种辐射敏感的组合物，包含1至80重量％的固体组分和20至99重量％的溶剂。固体组分包含化合物B，其具有（a）通过向多酚化合物A的至少一个酚羟基引入酸解离基而导出的结构，多酚化合物A通过二元至四元芳香酮或芳香醛的缩合反应，每个具有5至36个碳原子的化合物与具有1至3个酚羟基和6至15个碳原子的化合物结合，并且（b）分子量为400至2000。含有化合物B的组合物非常敏感于辐射，例如KrF准分子激光器，极紫外线，电子束和X射线，并且提供具有高分辨率，高耐热性和高蚀刻抗性的抗阻图案，因此可用作酸放大的非聚合物抗阻材料。
• POSITIVE RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN
  申请人：Kinoshita Yohei

  公开号：US20090098483A1

  公开（公告）日：2009-04-16

  A positive resist composition and method for forming a resist pattern are provided which enable a resist pattern with excellent shape to be obtained. The resist composition includes a resin component (A) which exhibits increased alkali solubility under action of acid, an acid-generator component (B) which generates acid upon irradiation and an organic solvent (S) in which the components (A) and (B) are dissolved, the resin component (A) including a copolymer (A1) containing: a structural unit (a1) having an acetal-type protected group, a structural unit (a2) derived from an acrylate ester having a lactone-containing polycyclic group, which is represented by general formula (a2-1) shown below; and a structural unit (a3) derived from an acrylate ester having a polar group-containing aliphatic hydrocarbon group: wherein R represents a hydrogen atom, a fluorine atom, a lower alkyl group or a fluorinated lower alkyl group; R′ represents a hydrogen atom, a lower alkyl group or an alkoxy group of 1 to 5 carbon atoms; and m represents 0 or 1.

  提供了一种正性光阻组合物和形成光阻图案的方法，可以获得具有优异形状的光阻图案。该光阻组合物包括树脂成分（A），在酸的作用下具有增加的碱溶性，酸发生剂成分（B），在辐照下生成酸，以及有机溶剂（S），其中成分（A）和（B）被溶解，树脂成分（A）包括一个共聚物（A1），该共聚物包含：具有缩醛型保护基的结构单元（a1），由含有内酯基多环群的丙烯酸酯衍生的结构单元（a2），其由下式表示：（a2-1）；以及由含有极性基团的脂肪族碳氢基团的丙烯酸酯衍生的结构单元（a3）：其中R表示氢原子、氟原子、低碳基或氟化低碳基；R'表示氢原子、低碳基或1至5个碳原子的烷氧基；m表示0或1。
• COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION
  申请人：ECHIGO Masatoshi

  公开号：US20110165516A1

  公开（公告）日：2011-07-07

  A radiation-sensitive composition containing 1 to 80% by weight of a solid component and 20 to 99% by weight of a solvent. The solid component contains a compound B which has (a) a structure derived from a polyphenol compound A by introducing an acid-dissociating group to at least one phenolic hydroxyl group of the polyphenol compound A which is synthesized by a condensation between a di- to tetrafunctional aromatic ketone or aromatic aldehyde each having 5 to 36 carbon atoms with a compound having 1 to 3 phenolic hydroxyl groups and 6 to 15 carbon atoms, and (b) a molecular weight of 400 to 2000. The composition containing the compound B is useful as an acid-amplified, non-polymeric resist material, because it is highly sensitive to radiation such as KrF excimer lasers, extreme ultraviolet rays, electron beams, and X-rays, and provides resist patterns with a high resolution, high heat resistance, and high etching resistance.

  一种辐射敏感组合物，含有1-80重量％的固体组分和20-99重量％的溶剂。固体组分包含化合物B，其具有（a）从多酚化合物A导出的结构，通过在多酚化合物A的至少一个酚羟基上引入酸解离基团而合成，多酚化合物A是由具有5至36个碳原子的二元至四元芳香酮或芳香醛与具有1至3个酚羟基和6至15个碳原子的化合物之间的缩合反应合成的；（b）分子量为400至2000。含有化合物B的组合物可用作酸放大，非聚合物抗蚀材料，因为它对KrF准分子激光、极紫外线、电子束和X射线等辐射非常敏感，并提供具有高分辨率、高耐热性和高蚀刻抗性的抗蚀图案。