hydroxygallic acid | 3934-92-7

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 异戊烯醇脂质
• 英文名称: hydroxygallic acid
• 英文别名: 2,3,4,5-Tetrahydroxy-benzoesaeure；Tetrahydroxy-benzoesaeure；2,3,4,5-Tetraoxy-benzoesaeure；2,3,4,5-tetrahydroxy-benzoic acid；2,3,4,5-Tetrahydroxybenzoic acid
• CAS: 3934-92-7
• 化学式: C₇H₆O₆
• 分子量: 186.121
• InChiKey: OZDWGFJBGUGKMY-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  0.7
• 重原子数：
  13
• 可旋转键数：
  1
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.0
• 拓扑面积：
  118
• 氢给体数：
  5
• 氢受体数：
  6

反应信息

• 作为反应物：
  描述：

  hydroxygallic acid 在 盐酸 作用下， 生成 1,2,3,4-tetrahydroxybenzene
  参考文献：
  名称：

  Mayer; Fikentscher, Chemische Berichte, 1956, vol. 89, p. 511,517

  摘要：

  DOI：
• 作为产物：
  描述：

  3,4,5-trimethoxysalicylic acid 在 aluminum tri-bromide 、 苯 作用下， 生成 hydroxygallic acid
  参考文献：
  名称：

  Mayer; Fikentscher, Chemische Berichte, 1956, vol. 89, p. 511,517

  摘要：

  DOI：

文献信息

• RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND COMPOUND
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US20200183273A1

  公开（公告）日：2020-06-11

  A resist composition including a base material component (A) whose solubility in a developing solution is changed due to the action of an acid, and a compound (D0) formed of an anion moiety and a cation moiety which is represented by Formula (d0), in which the cation moiety of the compound (D0) has a Log P value of less than 7.7. In the formula, M m+ represents an m-valent organic cation, R d0 represents a substituent, p represents an integer of 0 to 3, q represents an integer of 0 to 3, n represents an integer of 2 or greater, and a relationship of “n+p≤(q×2)+5” is satisfied.

  一种抗蚀组合物，包括一种基材料组分（A），由于酸的作用而在显影液中溶解性发生改变，以及由阴离子基团和由公式（d0）表示的阳离子基团组成的化合物（D0）。其中，化合物（D0）的阳离子基团的Log P值小于7.7。在公式中，Mm+表示m价有机阳离子，Rd0表示取代基，p表示0到3之间的整数，q表示0到3之间的整数，n表示大于等于2的整数，并且满足“n+p≤（q×2）+5”的关系。
• AQUEOUS INK
  申请人：Kao Corporation

  公开号：EP3473682A1

  公开（公告）日：2019-04-24

  The present invention relates to a water-based ink that contains pigment-containing polyester-based resin particles A, pigment-free polyester-based resin particles B, an organic solvent and water, in which a content of an organic solvent C having a boiling point of not higher than 235°C in a whole amount of the organic solvent is not less than 90% by mass. The water-based ink of the present invention can be improved in rub fastness, solvent resistance and adhesion to a non-water absorbing printing medium with good balance therebetween, even when printed on the non-water absorbing printing medium.

  本发明涉及一种水性油墨，它含有含颜料的聚酯基树脂颗粒 A、不含颜料的聚酯基树脂颗粒 B、有机溶剂和水，其中有机溶剂 C 的含量不低于有机溶剂总量的 90%（以质量计），该有机溶剂的沸点不高于 235℃。本发明的水性油墨可以提高耐摩擦牢度、耐溶剂性和对非吸水印刷介质的附着力，即使在非吸水印刷介质上印刷，两者之间也能保持良好的平衡。
• Aqueous ink
  申请人：KAO CORPORATION

  公开号：US10774229B2

  公开（公告）日：2020-09-15

  The present invention relates to a water-based ink that contains pigment-containing polyester-based resin particles A, pigment-free polyester-based resin particles B, an organic solvent and water, in which a content of an organic solvent C having a boiling point of not higher than 235° C. in a whole amount of the organic solvent is not less than 90% by mass. The water-based ink of the present invention can be improved in rub fastness, solvent resistance and adhesion to a non-water absorbing printing medium with good balance therebetween, even when printed on the non-water absorbing printing medium.

  本发明涉及一种水性油墨，它含有含颜料的聚酯基树脂颗粒 A、不含颜料的聚酯基树脂颗粒 B、有机溶剂和水，其中有机溶剂 C 的含量不高于有机溶剂总量的 90%（以质量计），该有机溶剂的沸点不高于 235°C。本发明的水性油墨可以提高耐摩擦牢度、耐溶剂性和对非吸水印刷介质的附着力，即使在非吸水印刷介质上印刷，两者之间也能保持良好的平衡。
• Composition for forming film protecting against aqueous hydrogen peroxide solution
  申请人：NISSAN CHEMICAL CORPORATION

  公开号：US10894887B2

  公开（公告）日：2021-01-19

  A composition for forming protective film against aqueous hydrogen peroxide solution, composition including resin; compound of following Formula (1a), (1b), or (1c): (wherein X is carbonyl group or methylene group; 1 and m are each independently integer of 0-5 to satisfy relation: 3≤1+m≤10; n is integer of 2-5; u and v are each independently integer of 0-4 to satisfy relation: 3≤u+v≤8; R1-R4 are each independently hydrogen atom, hydroxy group, C1-10 hydrocarbon group, or C6-20 aryl group; when R1-R4 are each the C1-10 hydrocarbon group; and j and k are each independently 0 or 1); crosslinking agent and catalyst; and solvent, wherein amount of compound of Formula (1a), (1b), or (1c) is at most 80% by mass relative to amount of resin, and amount of crosslinking agent is 5%-40% by mass relative to amount of resin.

  一种用于形成过氧化氢水溶液保护膜的组合物，该组合物包括树脂；下式 (1a)、(1b) 或 (1c) 的化合物： (其中 X 为羰基或亚甲基；1 和 m 各自独立地为 0-5 的整数，以满足以下关系：3≤1+m≤10；n 为 2-5 的整数；u 和 v 各自独立地为 0-4 的整数，以满足关系式： 3≤u+v≤8; R1-R4 各自独立地为氢原子：3≤u+v≤8；R1-R4各自独立地为氢原子、羟基、C1-10烃基或C6-20芳基；当R1-R4各自为C1-10烃基时；以及j和k各自独立地为0或1）；交联剂和催化剂；以及溶剂，其中式(1a)、(1b)或(1c)化合物的用量最多为树脂用量的80%，交联剂的用量为树脂用量的5%-40%。
• Protective film-forming composition
  申请人：NISSAN CHEMICAL CORPORATION

  公开号：US11112696B2

  公开（公告）日：2021-09-07

  A composition for forming protective films against aqueous hydrogen peroxide solutions, including: a compound of the following formula (1a) or formula (1b) or a compound having a substituent of the following formula (2) and having a molecular weight of 300 or more and less than 800 or a weight-average molecular weight of 300 or more and less than 800; and a solvent, the composition containing the compound of the formula (1a) or formula (1b) of 0.1% by mass to 60% by mass or the compound having the substituent of the formula (2) of 10% by mass to 100% by mass, relative to solids excluding the solvent: (wherein R1 is a C1-4 alkylene or alkenylene group or a direct bond, k is 0 or 1, m is an integer of 1 to 3, and n is an integer of 2 to 4.)

  一种用于形成针对过氧化氢水溶液的保护膜的组合物，包括： 下式（1a）或式（1b）的化合物或具有下式（2）取代基且分子量为 300 或以上且小于 800 或重量平均分子量为 300 或以上且小于 800 的化合物；以及溶剂，该组合物含有下式（1a）或式（1b）的化合物 0.相对于不包括溶剂的固体，该组合物含有质量分数为 0.1%至 60%的式 (1a) 或式 (1b) 化合物，或质量分数为 10%至 100%的具有式 (2) 取代基的化合物： (其中 R1 为 C1-4 亚烷基或烯基或直接键，k 为 0 或 1，m 为 1 至 3 的整数，n 为 2 至 4 的整数）。