SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
申请人:SUMITOMO CHEMICAL COMPANY, LIMITED
公开号:US20220146931A1
公开(公告)日:2022-05-12
Disclosed are a salt represented by formula (I), an acid generator and a resist composition:
wherein Q
1
and Q
2
each represent a fluorine atom or a perfluoroalkyl group; R
11
and R
12
each represent a hydrogen atom, a fluorine atom or a perfluoroalkyl group; z represents an integer of 0 to 6; X
1
and X
2
each represent *—CO—O—, *—O—CO—, etc.; L
1
represents a single bond or a hydrocarbon group which may have a substituent; A
1
represents a group having a lactone structure which may have a substituent; L
2
and L
3
each represent a single bond or an alkanediyl group; R
1
represents an iodine atom or a haloalkyl group; R
2
represents a halogen atom, a hydroxy group, a haloalkyl group or an alkyl group; m2 represents an integer of 0 to 4; and Z
+
represents an organic cation.