The Role of theα-Stereogenic Center in the Control of Stereoselection in the Reduction ofα-Alkyl-β-hydroxy Ketones: A Highly Diastereoselective Protocol for the Synthesis of 1,2-syn-2-Alkyl-1,3-diols
摘要:
Accurate investigations on the role played by an alpha-stereogenic center in controlling the reduction of various classes of beta-hydroxy ketones allowed us to set up a general and highly diastereoselective protocol for the synthesis of 2-alkyl-1,3-diols with 1,2-syn relationship. This methodology is based on the conversion of a beta-hydroxy ketone into the corresponding titanium alcoholate that permits us to organize the substrate in a stable and rigid structure, which stereofacially favors attacking hydride ions. The use of THF as solvent makes available a variety of hydride donors that cover a large spectrum of steric demand: the choice of the more appropriate one depends on the conformational stability of the cyclic intermediate. Excellent results are obtained also in the presence of an additional stereogenic center in the beta-position, even if it exerts a concordant or an opposite steric effect with respect to the alpha-substituent.
Sur les enolates lithies de cetones. Cetolisation mixte univoque et regiospecifique
作者:Françoise Gaudemar-bardone、Marcel Gaudemar
DOI:10.1016/s0022-328x(00)91373-1
日期:1976.1
A Convenient Preparation and Utilization of Lithium Dialkylamides
作者:F. Gaudemar-Bardone、M. Gaudemar
DOI:10.1055/s-1979-28721
日期:——
Etude en RMN d'une serie de β-diols diastereoisomeres et des dioxannes-1,3 correspondants
作者:MM.J.P. Maffrand、P. Maroni
DOI:10.1016/s0040-4039(01)88654-8
日期:1969.1
GAUDEMAR-BARDONE F.; GANDEMAR M., SYNTHESIS, 1979, NO 6, 463-465
作者:GAUDEMAR-BARDONE F.、 GANDEMAR M.
DOI:——
日期:——
POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERNS BY USING THE SAME
申请人:LIU Chi-Ming
公开号:US20120328799A1
公开(公告)日:2012-12-27
A photosensitive resin composition and a method for forming patterns by using the same are disclosed. The photosensitive resin composition comprises a novolac resin (A), an ortho-naphthoquinone diazide sulfonic acid ester (B) and a ketol solvent (C). The novolac resin (A) includes a high-ortho novolac resin (A-1) that has ortho-ortho methylene bonding to all methylene bonding in a ratio of 18% to 25%, and a weight ratio (A-1)/(C) of the high-ortho novolac resin (A-1) to the ketol solvent (C) is 0.1 to 2.0, thereby exhibiting excellent temporal stability and further forming patterns with superior film to thickness uniformity and high resolution.