Sulfonic acid esters are used as (a) compounds for forming a strong acid on irradiation in radiation-sensitive, positive or negative working mixtures also comprising (b) either a compound with at least one acid-decomposable C--O--C or C--O--Si bond (for positive working mixtures) or a compound with at least acid-cross-linkable groups (for negative working mixtures) and c) a binder which is insoluble in water but soluble or at least swellable in aqueous alkaline solutions, wherein said sulfonic acid esters are formula \x9bR.sup.1 --CR.sup.2 (CF.sub.3)--O--SO.sub.2 --!.sub.n R.sup.3(I) or R.sup.1 \x9b--CR.sup.2 (CF.sub.3)--O--SO.sub.2 --R.sup.3 !m (II) wherein R.sup.1, R.sup.2, R.sup.3, n and n are defined with the body of the disclosure. These mixtures are particularly suitable for exposure to deep UV radiation in the formation of recording materials suitable for the production of photoresists, electronic components, and printing plates.
磺酸酯被用作(a)化合物,在辐射敏感的正或负工作混合物中辐照时形成强酸,还包括(b)至少具有一个酸分解C-O-C或C-O-Si键的化合物(用于正工作混合物)或至少具有酸交联基团的化合物(用于负工作混合物),以及(c)一种在
水中不溶但在碱性
水溶液中可溶或至少可膨胀的粘合剂,其中所述的
磺酸酯为公式\x9bR.sup.1 --CR.sup.2 (CF.sub.3)--O--SO.sub.2 --!.sub.n R.sup.3(I)或R.sup.1\x9b--CR.sup.2 (CF.sub.3)--O--SO.sub.2 --R.sup.3 !m(II),其中R.sup.1,R.sup.2,R.sup.3,n和n在本文中有定义。这些混合物特别适用于深紫外辐射曝光,用于制备适用于光刻胶、电子元件和印刷版的记录材料。