(1,2,3,3,4,5,5,6,6,7,7-Undecafluoro-2-bicyclo[2.2.1]heptanyl)methyl 2-methylprop-2-enoate | 953777-54-3

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 异戊烯醇脂质
• 英文名称: (1,2,3,3,4,5,5,6,6,7,7-Undecafluoro-2-bicyclo[2.2.1]heptanyl)methyl 2-methylprop-2-enoate
• 英文别名: (1,2,3,3,4,5,5,6,6,7,7-undecafluoro-2-bicyclo[2.2.1]heptanyl)methyl 2-methylprop-2-enoate
• CAS: 953777-54-3
• 化学式: C₁₂H₇F₁₁O₂
• 分子量: 392.169
• InChiKey: ZUOIXNVCVKZSLV-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  4
• 重原子数：
  25
• 可旋转键数：
  4
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.75
• 拓扑面积：
  26.3
• 氢给体数：
  0
• 氢受体数：
  13

反应信息

• 作为产物：
  描述：

  (1,2,3,3,4,5,5,6,6,7,7-Undecafluoro-2-bicyclo[2.2.1]heptanyl)methanol 、 甲基丙烯酰氯 在 三乙胺 、 对苯二酚 作用下， 以 甲基叔丁基醚 为溶剂， 反应 17.0h， 生成 (1,2,3,3,4,5,5,6,6,7,7-Undecafluoro-2-bicyclo[2.2.1]heptanyl)methyl 2-methylprop-2-enoate
  参考文献：
  名称：

  FLUORINE-CONTAINING COMPOUND HAVING HIGHLY FLUORINATED NORBORNANE STRUCTURE, FLUORINE-CONTAINING POLYMER, AND THEIR PRODUCTION METHODS

  摘要：

  公开号：

  EP2039672B1

文献信息

• MATERIAL OF THE RESIST-PROTECTING MEMBRANE FOR IMMERSION LITHOGRAPHY
  申请人：Asahi Glass Company, Limited

  公开号：EP2009499A1

  公开（公告）日：2008-12-31

  To provide a resist protective film material for immersion lithography. An alkali soluble resist protective film material for immersion lithography, which comprises a polymer (F) containing repeating units (FU) formed by polymerizing a polymerizable compound (fm) having a fluorine-containing bridged cyclic structure. For example, repeating units (FU) are repeating units formed by polymerizing a compound (f) selected from the group consisting of the following formulae (f1) to (f4) (RF represents H, F, a C1-3 alkyl group or a C1-3 fluoroalkyl group, and XF represents F, OH or CH2OH.)

  提供一种用于浸入式光刻的抗蚀剂保护膜材料。 一种用于浸渍光刻的碱溶性抗蚀剂保护膜材料，它包括一种聚合物（F），其中含有通过聚合具有含氟桥环结构的可聚合化合物（fm）而形成的重复单元（FU）。例如，重复单元 (FU) 是通过聚合选自下式 (f1) 至 (f4) 组的化合物 (f) 而形成的重复单元（RF 代表 H、F、C1-3 烷基或 C1-3 氟烷基，XF 代表 F、OH 或 CH2OH）。
• MATERIAL FOR RESIST PROTECTIVE FILM FOR IMMERSION LITHOGRAPHY
  申请人：Takebe Yoko

  公开号：US20090061360A1

  公开（公告）日：2009-03-05

  To provide a resist protective film material for immersion lithography. An alkali soluble resist protective film material for immersion lithography, which comprises a polymer (F) containing repeating units (F U ) formed by polymerizing a polymerizable compound (f m ) having a fluorine-containing bridged cyclic structure. For example, repeating units (F U ) are repeating units formed by polymerizing a compound (f) selected from the group consisting of the following formulae (f1) to (f4) (R F represents H, F, a C 1-3 alkyl group or a C 1-3 fluoroalkyl group, and X F represents F, OH or CH 2 OH.)